Morphology change of the silicon surface induced by Ar⁺ ion beam sputtering

Two-level modeling for nanoscale pattern formation on silicon target by Ar⁺ ion sputtering is presented. Phase diagram illustrating possible nanosize surface patterns is discussed. Scaling characteristics for the structure wavelength dependence versus incoming ion energy are d...

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Bibliographic Details

Published in:	Condensed Matter Physics
Main Authors:	D.O. Kharchenko, V.O. Kharchenko
Format:	Article
Language:	English
Published:	Yukhnovskii Institute for Condensed Matter Physics of the National Academy of Sciences of Ukraine 2011-06-01
Subjects:	ion-beam sputtering surface morphology nanoscale structures
Online Access:	http://dx.doi.org/10.5488/CMP.14.23602