Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering
Two-level modeling for nanoscale pattern formation on silicon target by Ar<sup>+</sup> ion sputtering is presented. Phase diagram illustrating possible nanosize surface patterns is discussed. Scaling characteristics for the structure wavelength dependence versus incoming ion energy are d...
| Published in: | Condensed Matter Physics |
|---|---|
| Main Authors: | , |
| Format: | Article |
| Language: | English |
| Published: |
Yukhnovskii Institute for Condensed Matter Physics of the National Academy of Sciences of Ukraine
2011-06-01
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| Subjects: | |
| Online Access: | http://dx.doi.org/10.5488/CMP.14.23602 |
| _version_ | 1848651459440148480 |
|---|---|
| author | D.O. Kharchenko V.O. Kharchenko |
| author_facet | D.O. Kharchenko V.O. Kharchenko |
| author_sort | D.O. Kharchenko |
| collection | DOAJ |
| container_title | Condensed Matter Physics |
| description | Two-level modeling for nanoscale pattern formation on silicon target by Ar<sup>+</sup> ion sputtering is presented. Phase diagram illustrating possible nanosize surface patterns is discussed. Scaling characteristics for the structure wavelength dependence versus incoming ion energy are defined. Growth and roughness exponents in different domains of the phase diagram are obtained. |
| format | Article |
| id | doaj-e6e68bcef7be4da69c27f6499438935a |
| institution | Directory of Open Access Journals |
| issn | 1607-324X |
| language | English |
| publishDate | 2011-06-01 |
| publisher | Yukhnovskii Institute for Condensed Matter Physics of the National Academy of Sciences of Ukraine |
| record_format | Article |
| spelling | doaj-e6e68bcef7be4da69c27f6499438935a2025-11-03T00:50:18ZengYukhnovskii Institute for Condensed Matter Physics of the National Academy of Sciences of UkraineCondensed Matter Physics1607-324X2011-06-0114223602Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputteringD.O. KharchenkoV.O. KharchenkoTwo-level modeling for nanoscale pattern formation on silicon target by Ar<sup>+</sup> ion sputtering is presented. Phase diagram illustrating possible nanosize surface patterns is discussed. Scaling characteristics for the structure wavelength dependence versus incoming ion energy are defined. Growth and roughness exponents in different domains of the phase diagram are obtained.http://dx.doi.org/10.5488/CMP.14.23602ion-beam sputteringsurface morphologynanoscale structures |
| spellingShingle | D.O. Kharchenko V.O. Kharchenko Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering ion-beam sputtering surface morphology nanoscale structures |
| title | Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering |
| title_full | Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering |
| title_fullStr | Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering |
| title_full_unstemmed | Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering |
| title_short | Morphology change of the silicon surface induced by Ar<sup>+</sup> ion beam sputtering |
| title_sort | morphology change of the silicon surface induced by ar sup sup ion beam sputtering |
| topic | ion-beam sputtering surface morphology nanoscale structures |
| url | http://dx.doi.org/10.5488/CMP.14.23602 |
| work_keys_str_mv | AT dokharchenko morphologychangeofthesiliconsurfaceinducedbyarsupsupionbeamsputtering AT vokharchenko morphologychangeofthesiliconsurfaceinducedbyarsupsupionbeamsputtering |