Silicon Oxide Etching Process of NF₃ and F₃NO Plasmas with a Residual Gas Analyzer

by Woo-Jae Kim, In-Young Bang, Ji-Hwan Kim, Yeon-Soo Park, Hee-Tae Kwon, Gi-Won Shin, Min-Ho Kang, Youngjun Cho, Byung-Hyang Kwon, Jung-Hun Kwak, Gi-Chung Kwon
Published 2021-06-01