Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering

Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering

Titanium-boron-nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using a single TiB2 target. The films were deposited under different Ar:N2 ratios. The instrumented indentation technique (nanoindentation), is used to evaluate the mechanical properties of the films. A methodology...

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Bibliographic Details
Main Authors:	P. K. Purnapu Rupa, P. C. Chakraborti, S. K. Mishra
Format:	Article
Language:	English
Published:	al-Farabi Kazakh National University 2011-04-01
Series:	Eurasian Chemico-Technological Journal
Online Access:	http://ect-journal.kz/index.php/ectj/article/view/438

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