Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering
Titanium-boron-nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using a single TiB2 target. The films were deposited under different Ar:N2 ratios. The instrumented indentation technique (nanoindentation), is used to evaluate the mechanical properties of the films. A methodology...
Main Authors: | P. K. Purnapu Rupa, P. C. Chakraborti, S. K. Mishra |
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Format: | Article |
Language: | English |
Published: |
al-Farabi Kazakh National University
2011-04-01
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Series: | Eurasian Chemico-Technological Journal |
Online Access: | http://ect-journal.kz/index.php/ectj/article/view/438 |
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