Demonstration of Distributed Etched Diffraction Grating Demultiplexer
The design principles and measurement results for a compact shallow etched distributed diffraction grating waveguide demultiplexer are presented. The deeply etched diffraction grating facets are replaced with a shallow etched odd-order quarter wavelength Bragg reflector to increase the Fresnel refle...
Main Authors: | , |
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Format: | Article |
Language: | English |
Published: |
IEEE
2011-01-01
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Series: | IEEE Photonics Journal |
Subjects: | |
Online Access: | https://ieeexplore.ieee.org/document/5876294/ |
Summary: | The design principles and measurement results for a compact shallow etched distributed diffraction grating waveguide demultiplexer are presented. The deeply etched diffraction grating facets are replaced with a shallow etched odd-order quarter wavelength Bragg reflector to increase the Fresnel reflection coefficient. A prototype device was designed for coarse wavelength demultiplexing applications and was fabricated in nanophotonic silicon-on-insulator platform using deep ultraviolet (DUV) optical lithography. The demultiplexer, which supports four channels with 20-nm channel spacing, shows a crosstalk of -25 dB. |
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ISSN: | 1943-0655 |