Compositional analysis of silicon oxide/silicon nitride thin films
Hydrogen, amorphous silicon nitride (SiNx:H abbreviated SiNx) films were grown on multicrystalline silicon (mc-Si) substrate by plasma enhanced chemical vapour deposition (PECVD) in parallel configuration using NH3/SiH4 gas mixtures. The mc-Si wafers were taken from the same column of Si cast ingot....
Main Authors: | Meziani Samir, Moussi Abderrahmane, Mahiou Linda, Outemzabet Ratiba |
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Format: | Article |
Language: | English |
Published: |
Sciendo
2016-06-01
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Series: | Materials Science-Poland |
Subjects: | |
Online Access: | https://doi.org/10.1515/msp-2016-0057 |
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