Reliability growth of thin film resistors contact

Necessity of resistive layer growth under the contact and in the contact zone of resistive element is shown in order to reduce peak values of current flow and power dissipation in the contact of thin film resistor, thereby to increase the resistor stability to parametric and catastrophic failures.

Bibliographic Details
Main Authors: Lugin A. N., Ozemsha M. M.
Format: Article
Language:English
Published: Politehperiodika 2010-10-01
Series:Tekhnologiya i Konstruirovanie v Elektronnoi Apparature
Subjects:
Online Access:http://www.tkea.com.ua/tkea/2010/5-6_2010/pdf/03.zip
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spelling doaj-1021abd3518b45fabc49bf38c6419d982020-11-25T01:42:31ZengPolitehperiodikaTekhnologiya i Konstruirovanie v Elektronnoi Apparature2225-58182010-10-015-61114Reliability growth of thin film resistors contactLugin A. N.Ozemsha M. M.Necessity of resistive layer growth under the contact and in the contact zone of resistive element is shown in order to reduce peak values of current flow and power dissipation in the contact of thin film resistor, thereby to increase the resistor stability to parametric and catastrophic failures.http://www.tkea.com.ua/tkea/2010/5-6_2010/pdf/03.zipcontactthin film resistorcurrent densitydissipation power
collection DOAJ
language English
format Article
sources DOAJ
author Lugin A. N.
Ozemsha M. M.
spellingShingle Lugin A. N.
Ozemsha M. M.
Reliability growth of thin film resistors contact
Tekhnologiya i Konstruirovanie v Elektronnoi Apparature
contact
thin film resistor
current density
dissipation power
author_facet Lugin A. N.
Ozemsha M. M.
author_sort Lugin A. N.
title Reliability growth of thin film resistors contact
title_short Reliability growth of thin film resistors contact
title_full Reliability growth of thin film resistors contact
title_fullStr Reliability growth of thin film resistors contact
title_full_unstemmed Reliability growth of thin film resistors contact
title_sort reliability growth of thin film resistors contact
publisher Politehperiodika
series Tekhnologiya i Konstruirovanie v Elektronnoi Apparature
issn 2225-5818
publishDate 2010-10-01
description Necessity of resistive layer growth under the contact and in the contact zone of resistive element is shown in order to reduce peak values of current flow and power dissipation in the contact of thin film resistor, thereby to increase the resistor stability to parametric and catastrophic failures.
topic contact
thin film resistor
current density
dissipation power
url http://www.tkea.com.ua/tkea/2010/5-6_2010/pdf/03.zip
work_keys_str_mv AT luginan reliabilitygrowthofthinfilmresistorscontact
AT ozemshamm reliabilitygrowthofthinfilmresistorscontact
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