Hafnium dioxide as a dielectric for highly-sensitive waveguide-coupled surface plasmon resonance sensors

Hafnium dioxide has been recognized as an excellent dielectric for microelectronics. However, its usefulness for the surface plasmon based sensors has not yet been tested. Here we investigate its usefulness for waveguide-coupled bi-metallic surface plasmon resonance sensors. Several Ag/HfO2/Au multi...

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Main Authors: Kunal Tiwari, Suresh C. Sharma, Nader Hozhabri
Format: Article
Language:English
Published: AIP Publishing LLC 2016-04-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4948454
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spelling doaj-11effe1b94f248fa9dc6bab89740fb152020-11-24T21:29:52ZengAIP Publishing LLCAIP Advances2158-32262016-04-0164045217045217-510.1063/1.4948454071604ADVHafnium dioxide as a dielectric for highly-sensitive waveguide-coupled surface plasmon resonance sensorsKunal Tiwari0Suresh C. Sharma1Nader Hozhabri2Department of Physics, University of Texas at Arlington, Arlington, Texas 76019, USADepartment of Physics, University of Texas at Arlington, Arlington, Texas 76019, USANanotechnology Research Center, Shimadzu Institute, University of Texas at Arlington, Arlington, Texas 76019, USAHafnium dioxide has been recognized as an excellent dielectric for microelectronics. However, its usefulness for the surface plasmon based sensors has not yet been tested. Here we investigate its usefulness for waveguide-coupled bi-metallic surface plasmon resonance sensors. Several Ag/HfO2/Au multilayer structure sensors were fabricated and evaluated by optical measurements and computer simulations. The resulting data establish correlations between the growth parameters and sensor performance. The sensor sensitivity to refractive index of analytes is determined to be S n = ∂ θ SPR ∂ n ≥ 4 7 0 . The sensitivity data are supported by simulations, which also predict 314 nm for the evanescent field decay length in air.http://dx.doi.org/10.1063/1.4948454
collection DOAJ
language English
format Article
sources DOAJ
author Kunal Tiwari
Suresh C. Sharma
Nader Hozhabri
spellingShingle Kunal Tiwari
Suresh C. Sharma
Nader Hozhabri
Hafnium dioxide as a dielectric for highly-sensitive waveguide-coupled surface plasmon resonance sensors
AIP Advances
author_facet Kunal Tiwari
Suresh C. Sharma
Nader Hozhabri
author_sort Kunal Tiwari
title Hafnium dioxide as a dielectric for highly-sensitive waveguide-coupled surface plasmon resonance sensors
title_short Hafnium dioxide as a dielectric for highly-sensitive waveguide-coupled surface plasmon resonance sensors
title_full Hafnium dioxide as a dielectric for highly-sensitive waveguide-coupled surface plasmon resonance sensors
title_fullStr Hafnium dioxide as a dielectric for highly-sensitive waveguide-coupled surface plasmon resonance sensors
title_full_unstemmed Hafnium dioxide as a dielectric for highly-sensitive waveguide-coupled surface plasmon resonance sensors
title_sort hafnium dioxide as a dielectric for highly-sensitive waveguide-coupled surface plasmon resonance sensors
publisher AIP Publishing LLC
series AIP Advances
issn 2158-3226
publishDate 2016-04-01
description Hafnium dioxide has been recognized as an excellent dielectric for microelectronics. However, its usefulness for the surface plasmon based sensors has not yet been tested. Here we investigate its usefulness for waveguide-coupled bi-metallic surface plasmon resonance sensors. Several Ag/HfO2/Au multilayer structure sensors were fabricated and evaluated by optical measurements and computer simulations. The resulting data establish correlations between the growth parameters and sensor performance. The sensor sensitivity to refractive index of analytes is determined to be S n = ∂ θ SPR ∂ n ≥ 4 7 0 . The sensitivity data are supported by simulations, which also predict 314 nm for the evanescent field decay length in air.
url http://dx.doi.org/10.1063/1.4948454
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AT naderhozhabri hafniumdioxideasadielectricforhighlysensitivewaveguidecoupledsurfaceplasmonresonancesensors
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