Superhydrophobic Polyimide via Ultraviolet Photooxidation: The Evolution of Surface Morphology and Hydrophobicity under Different Ultraviolet Intensities

Ultraviolet (UV) photooxidation has recently been developed to fabricate superhydrophobic polyimide (PI) films in combination with fluoroalkylsilane modification. However, it remains unclear whether the surface morphology and hydrophobicity are sensitive to technical parameters such as UV intensity...

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Main Authors: Hongyu Gu, Lixin Song, Jinlin Zhang, Zhenyi Qi
Format: Article
Language:English
Published: Hindawi Limited 2015-01-01
Series:Journal of Nanomaterials
Online Access:http://dx.doi.org/10.1155/2015/546384
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spelling doaj-188b367b8d52452bb13c960d1b960f632020-11-24T23:16:13ZengHindawi LimitedJournal of Nanomaterials1687-41101687-41292015-01-01201510.1155/2015/546384546384Superhydrophobic Polyimide via Ultraviolet Photooxidation: The Evolution of Surface Morphology and Hydrophobicity under Different Ultraviolet IntensitiesHongyu Gu0Lixin Song1Jinlin Zhang2Zhenyi Qi3Key Laboratory of Inorganic Coating Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences, 1295 Dingxi Road, Shanghai 200050, ChinaKey Laboratory of Inorganic Coating Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences, 1295 Dingxi Road, Shanghai 200050, ChinaKey Laboratory of Inorganic Coating Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences, 1295 Dingxi Road, Shanghai 200050, ChinaKey Laboratory of Inorganic Coating Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences, 1295 Dingxi Road, Shanghai 200050, ChinaUltraviolet (UV) photooxidation has recently been developed to fabricate superhydrophobic polyimide (PI) films in combination with fluoroalkylsilane modification. However, it remains unclear whether the surface morphology and hydrophobicity are sensitive to technical parameters such as UV intensity and radiation environment. Herein, we focus on the effects of UV intensity on PI surface structure and wettability to gain comprehensive understanding and more effective control of this technology. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) results showed that UV intensity governed the evolutionary pattern of surface morphology: lower UV intensity (5 mW/cm2) facilitated in-plane expansion of dendritic protrusions while stronger UV (10 and 15 mW/cm2) encouraged localized growth of protrusions in a piling-up manner. Surface roughness and hydrophobicity maximized at the intensity of 10 mW/cm2, as a consequence of the slowed horizontal expansion and preferred vertical growth of the protrusions when UV intensity increased. Based on these results, the mechanism that surface micro/nanostructures developed in distinct ways when exposed to different UV intensities was proposed. Though superhydrophobicity (water contact angle larger than 150°) can be achieved at UV intensity not less than 10 mW/cm2, higher intensity decreased the effectiveness. Therefore, the UV photooxidation under 10 mW/cm2 for 72 h is recommended to fabricate superhydrophobic PI films.http://dx.doi.org/10.1155/2015/546384
collection DOAJ
language English
format Article
sources DOAJ
author Hongyu Gu
Lixin Song
Jinlin Zhang
Zhenyi Qi
spellingShingle Hongyu Gu
Lixin Song
Jinlin Zhang
Zhenyi Qi
Superhydrophobic Polyimide via Ultraviolet Photooxidation: The Evolution of Surface Morphology and Hydrophobicity under Different Ultraviolet Intensities
Journal of Nanomaterials
author_facet Hongyu Gu
Lixin Song
Jinlin Zhang
Zhenyi Qi
author_sort Hongyu Gu
title Superhydrophobic Polyimide via Ultraviolet Photooxidation: The Evolution of Surface Morphology and Hydrophobicity under Different Ultraviolet Intensities
title_short Superhydrophobic Polyimide via Ultraviolet Photooxidation: The Evolution of Surface Morphology and Hydrophobicity under Different Ultraviolet Intensities
title_full Superhydrophobic Polyimide via Ultraviolet Photooxidation: The Evolution of Surface Morphology and Hydrophobicity under Different Ultraviolet Intensities
title_fullStr Superhydrophobic Polyimide via Ultraviolet Photooxidation: The Evolution of Surface Morphology and Hydrophobicity under Different Ultraviolet Intensities
title_full_unstemmed Superhydrophobic Polyimide via Ultraviolet Photooxidation: The Evolution of Surface Morphology and Hydrophobicity under Different Ultraviolet Intensities
title_sort superhydrophobic polyimide via ultraviolet photooxidation: the evolution of surface morphology and hydrophobicity under different ultraviolet intensities
publisher Hindawi Limited
series Journal of Nanomaterials
issn 1687-4110
1687-4129
publishDate 2015-01-01
description Ultraviolet (UV) photooxidation has recently been developed to fabricate superhydrophobic polyimide (PI) films in combination with fluoroalkylsilane modification. However, it remains unclear whether the surface morphology and hydrophobicity are sensitive to technical parameters such as UV intensity and radiation environment. Herein, we focus on the effects of UV intensity on PI surface structure and wettability to gain comprehensive understanding and more effective control of this technology. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) results showed that UV intensity governed the evolutionary pattern of surface morphology: lower UV intensity (5 mW/cm2) facilitated in-plane expansion of dendritic protrusions while stronger UV (10 and 15 mW/cm2) encouraged localized growth of protrusions in a piling-up manner. Surface roughness and hydrophobicity maximized at the intensity of 10 mW/cm2, as a consequence of the slowed horizontal expansion and preferred vertical growth of the protrusions when UV intensity increased. Based on these results, the mechanism that surface micro/nanostructures developed in distinct ways when exposed to different UV intensities was proposed. Though superhydrophobicity (water contact angle larger than 150°) can be achieved at UV intensity not less than 10 mW/cm2, higher intensity decreased the effectiveness. Therefore, the UV photooxidation under 10 mW/cm2 for 72 h is recommended to fabricate superhydrophobic PI films.
url http://dx.doi.org/10.1155/2015/546384
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