Effect of Bias Voltage on Microstructure and Properties of Tantalum Nitride Coatings Deposited by RF Magnetron Sputtering
TaN<i><sub>x</sub></i> coatings were deposited by RF magnetron sputtering with different bias voltages. The growth morphology, crystalline structure, chemical bond structure, hardness and elastic modulus, adhesion strength and tribological performance of the coatings were stu...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-07-01
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| Series: | Coatings |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-6412/11/8/911 |