Effect of Bias Voltage on Microstructure and Properties of Tantalum Nitride Coatings Deposited by RF Magnetron Sputtering

Effect of Bias Voltage on Microstructure and Properties of Tantalum Nitride Coatings Deposited by RF Magnetron Sputtering

TaN<i><sub>x</sub></i> coatings were deposited by RF magnetron sputtering with different bias voltages. The growth morphology, crystalline structure, chemical bond structure, hardness and elastic modulus, adhesion strength and tribological performance of the coatings were stu...

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Bibliographic Details
Main Authors:	Wei Dai, Yunzhan Shi
Format:	Article
Language:	English
Published:	MDPI AG 2021-07-01
Series:	Coatings
Subjects:	tantalum nitride RF sputtering structure hardness tribology
Online Access:	https://www.mdpi.com/2079-6412/11/8/911

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