Microstructure and erosion characteristics of Ni-AlN thin films prepared by electrodeposition
Ni-AlN thin films were successfully fabricated via direct-current (DC), pulse-current (PC), and ultrasonic-assisted pulse-current (UAPC) deposition. The microstructure, microhardness, and erosion characteristics of the Ni-AlN thin films were determined with the use of scanning probe microscopy (SPM)...
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doaj-1e70a5e3d3fc4d70a9fae184dc810a232021-09-05T14:00:30ZengDe GruyterScience and Engineering of Composite Materials0792-12332191-03592016-07-0123439540010.1515/secm-2014-0182Microstructure and erosion characteristics of Ni-AlN thin films prepared by electrodepositionLi Wei0Zhu Yongyong1Xia FafengCollege of Petroleum Engineering, Northeast Petroleum University, Daqing 163318, PR ChinaDepartment of Economics and Business Administration, Chongqing University of Education, Chongqing 400067, PR ChinaNi-AlN thin films were successfully fabricated via direct-current (DC), pulse-current (PC), and ultrasonic-assisted pulse-current (UAPC) deposition. The microstructure, microhardness, and erosion characteristics of the Ni-AlN thin films were determined with the use of scanning probe microscopy (SPM), X-ray diffraction (XRD), Vickers hardness test, electrochemical station, and scanning electron microscopy (SEM). SPM results revealed that the Ni-AlN thin films synthesized by UAPC deposition have a compact and fine morphology with average grain diameters of the Ni and AlN particles of approximately 97.7 and 40.2 nm, respectively. Based on the XRD results, the Ni-AlN thin films consist of Ni and AlN phases. The Ni-AlN thin films prepared by DC, PC, and UAPC deposition at 4.5 A/dm2 current density exhibited an optimum microhardness value of 904, 943, and 987 HV, respectively. Based on the erosion test results, the films prepared by UAPC deposition possesses the best corrosion resistance among the prepared thin films. The corrosion potentials of the DC-, PC-, and UAPC-deposited films were -0.552, -0.473, and -0.446 V vs. SCE, respectively.https://doi.org/10.1515/secm-2014-0182erosionmicrostructureni-aln thin film |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Li Wei Zhu Yongyong Xia Fafeng |
spellingShingle |
Li Wei Zhu Yongyong Xia Fafeng Microstructure and erosion characteristics of Ni-AlN thin films prepared by electrodeposition Science and Engineering of Composite Materials erosion microstructure ni-aln thin film |
author_facet |
Li Wei Zhu Yongyong Xia Fafeng |
author_sort |
Li Wei |
title |
Microstructure and erosion characteristics of Ni-AlN thin films prepared by electrodeposition |
title_short |
Microstructure and erosion characteristics of Ni-AlN thin films prepared by electrodeposition |
title_full |
Microstructure and erosion characteristics of Ni-AlN thin films prepared by electrodeposition |
title_fullStr |
Microstructure and erosion characteristics of Ni-AlN thin films prepared by electrodeposition |
title_full_unstemmed |
Microstructure and erosion characteristics of Ni-AlN thin films prepared by electrodeposition |
title_sort |
microstructure and erosion characteristics of ni-aln thin films prepared by electrodeposition |
publisher |
De Gruyter |
series |
Science and Engineering of Composite Materials |
issn |
0792-1233 2191-0359 |
publishDate |
2016-07-01 |
description |
Ni-AlN thin films were successfully fabricated via direct-current (DC), pulse-current (PC), and ultrasonic-assisted pulse-current (UAPC) deposition. The microstructure, microhardness, and erosion characteristics of the Ni-AlN thin films were determined with the use of scanning probe microscopy (SPM), X-ray diffraction (XRD), Vickers hardness test, electrochemical station, and scanning electron microscopy (SEM). SPM results revealed that the Ni-AlN thin films synthesized by UAPC deposition have a compact and fine morphology with average grain diameters of the Ni and AlN particles of approximately 97.7 and 40.2 nm, respectively. Based on the XRD results, the Ni-AlN thin films consist of Ni and AlN phases. The Ni-AlN thin films prepared by DC, PC, and UAPC deposition at 4.5 A/dm2 current density exhibited an optimum microhardness value of 904, 943, and 987 HV, respectively. Based on the erosion test results, the films prepared by UAPC deposition possesses the best corrosion resistance among the prepared thin films. The corrosion potentials of the DC-, PC-, and UAPC-deposited films were -0.552, -0.473, and -0.446 V vs. SCE, respectively. |
topic |
erosion microstructure ni-aln thin film |
url |
https://doi.org/10.1515/secm-2014-0182 |
work_keys_str_mv |
AT liwei microstructureanderosioncharacteristicsofnialnthinfilmspreparedbyelectrodeposition AT zhuyongyong microstructureanderosioncharacteristicsofnialnthinfilmspreparedbyelectrodeposition AT xiafafeng microstructureanderosioncharacteristicsofnialnthinfilmspreparedbyelectrodeposition |
_version_ |
1717811823255748608 |