A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic Pulses
A new monochromator with high spectral resolution in the extreme ultraviolet (XUV) has been developed for high-order laser harmonics selection. The system has three optical elements—a cylindrical (or spherical) focusing mirror, a uniform-line-spaced plane grating, and a plane mirror. The l...
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doaj-1e80074f7360496b94ba41af37a717e02020-11-25T01:08:59ZengMDPI AGApplied Sciences2076-34172019-06-01912250210.3390/app9122502app9122502A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic PulsesNicola Fabris0Paolo Miotti1Fabio Frassetto2Luca Poletto3National Research Council Institute of Photonics and Nanotechnologies, 35131 Padova, ItalyNational Research Council Institute of Photonics and Nanotechnologies, 35131 Padova, ItalyNational Research Council Institute of Photonics and Nanotechnologies, 35131 Padova, ItalyNational Research Council Institute of Photonics and Nanotechnologies, 35131 Padova, ItalyA new monochromator with high spectral resolution in the extreme ultraviolet (XUV) has been developed for high-order laser harmonics selection. The system has three optical elements—a cylindrical (or spherical) focusing mirror, a uniform-line-spaced plane grating, and a plane mirror. The last element is required to maintain the focus on a fixed vertical slit when the grating subtended angle is changed in order to minimize the spectral defocusing aberration. The parameters of the focusing mirror are determined to introduce a coma that compensates for the coma given by the grating. The possibility of using two interchangeable gratings made the set-up optimized for a broad energy range of 12−50 eV. As a design test case, the set-up has been applied to a selection of the discrete spectral lines emitted by a gas-discharge lamp as the XUV source, obtaining a resolving power E/<inline-formula> <math display="inline"> <semantics> <mo>Δ</mo> </semantics> </math> </inline-formula>E > 3000.https://www.mdpi.com/2076-3417/9/12/2502high-order harmonic generationultrafast pulsesextreme ultraviolethigh resolutionmonochromators |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Nicola Fabris Paolo Miotti Fabio Frassetto Luca Poletto |
spellingShingle |
Nicola Fabris Paolo Miotti Fabio Frassetto Luca Poletto A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic Pulses Applied Sciences high-order harmonic generation ultrafast pulses extreme ultraviolet high resolution monochromators |
author_facet |
Nicola Fabris Paolo Miotti Fabio Frassetto Luca Poletto |
author_sort |
Nicola Fabris |
title |
A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic Pulses |
title_short |
A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic Pulses |
title_full |
A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic Pulses |
title_fullStr |
A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic Pulses |
title_full_unstemmed |
A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic Pulses |
title_sort |
high resolution xuv grating monochromator for the spectral selection of ultrashort harmonic pulses |
publisher |
MDPI AG |
series |
Applied Sciences |
issn |
2076-3417 |
publishDate |
2019-06-01 |
description |
A new monochromator with high spectral resolution in the extreme ultraviolet (XUV) has been developed for high-order laser harmonics selection. The system has three optical elements—a cylindrical (or spherical) focusing mirror, a uniform-line-spaced plane grating, and a plane mirror. The last element is required to maintain the focus on a fixed vertical slit when the grating subtended angle is changed in order to minimize the spectral defocusing aberration. The parameters of the focusing mirror are determined to introduce a coma that compensates for the coma given by the grating. The possibility of using two interchangeable gratings made the set-up optimized for a broad energy range of 12−50 eV. As a design test case, the set-up has been applied to a selection of the discrete spectral lines emitted by a gas-discharge lamp as the XUV source, obtaining a resolving power E/<inline-formula> <math display="inline"> <semantics> <mo>Δ</mo> </semantics> </math> </inline-formula>E > 3000. |
topic |
high-order harmonic generation ultrafast pulses extreme ultraviolet high resolution monochromators |
url |
https://www.mdpi.com/2076-3417/9/12/2502 |
work_keys_str_mv |
AT nicolafabris ahighresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses AT paolomiotti ahighresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses AT fabiofrassetto ahighresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses AT lucapoletto ahighresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses AT nicolafabris highresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses AT paolomiotti highresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses AT fabiofrassetto highresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses AT lucapoletto highresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses |
_version_ |
1725180627129466880 |