A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic Pulses

A new monochromator with high spectral resolution in the extreme ultraviolet (XUV) has been developed for high-order laser harmonics selection. The system has three optical elements—a cylindrical (or spherical) focusing mirror, a uniform-line-spaced plane grating, and a plane mirror. The l...

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Main Authors: Nicola Fabris, Paolo Miotti, Fabio Frassetto, Luca Poletto
Format: Article
Language:English
Published: MDPI AG 2019-06-01
Series:Applied Sciences
Subjects:
Online Access:https://www.mdpi.com/2076-3417/9/12/2502
id doaj-1e80074f7360496b94ba41af37a717e0
record_format Article
spelling doaj-1e80074f7360496b94ba41af37a717e02020-11-25T01:08:59ZengMDPI AGApplied Sciences2076-34172019-06-01912250210.3390/app9122502app9122502A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic PulsesNicola Fabris0Paolo Miotti1Fabio Frassetto2Luca Poletto3National Research Council Institute of Photonics and Nanotechnologies, 35131 Padova, ItalyNational Research Council Institute of Photonics and Nanotechnologies, 35131 Padova, ItalyNational Research Council Institute of Photonics and Nanotechnologies, 35131 Padova, ItalyNational Research Council Institute of Photonics and Nanotechnologies, 35131 Padova, ItalyA new monochromator with high spectral resolution in the extreme ultraviolet (XUV) has been developed for high-order laser harmonics selection. The system has three optical elements&#8212;a cylindrical (or spherical) focusing mirror, a uniform-line-spaced plane grating, and a plane mirror. The last element is required to maintain the focus on a fixed vertical slit when the grating subtended angle is changed in order to minimize the spectral defocusing aberration. The parameters of the focusing mirror are determined to introduce a coma that compensates for the coma given by the grating. The possibility of using two interchangeable gratings made the set-up optimized for a broad energy range of 12&#8722;50 eV. As a design test case, the set-up has been applied to a selection of the discrete spectral lines emitted by a gas-discharge lamp as the XUV source, obtaining a resolving power E/<inline-formula> <math display="inline"> <semantics> <mo>&#916;</mo> </semantics> </math> </inline-formula>E &gt; 3000.https://www.mdpi.com/2076-3417/9/12/2502high-order harmonic generationultrafast pulsesextreme ultraviolethigh resolutionmonochromators
collection DOAJ
language English
format Article
sources DOAJ
author Nicola Fabris
Paolo Miotti
Fabio Frassetto
Luca Poletto
spellingShingle Nicola Fabris
Paolo Miotti
Fabio Frassetto
Luca Poletto
A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic Pulses
Applied Sciences
high-order harmonic generation
ultrafast pulses
extreme ultraviolet
high resolution
monochromators
author_facet Nicola Fabris
Paolo Miotti
Fabio Frassetto
Luca Poletto
author_sort Nicola Fabris
title A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic Pulses
title_short A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic Pulses
title_full A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic Pulses
title_fullStr A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic Pulses
title_full_unstemmed A High Resolution XUV Grating Monochromator for the Spectral Selection of Ultrashort Harmonic Pulses
title_sort high resolution xuv grating monochromator for the spectral selection of ultrashort harmonic pulses
publisher MDPI AG
series Applied Sciences
issn 2076-3417
publishDate 2019-06-01
description A new monochromator with high spectral resolution in the extreme ultraviolet (XUV) has been developed for high-order laser harmonics selection. The system has three optical elements&#8212;a cylindrical (or spherical) focusing mirror, a uniform-line-spaced plane grating, and a plane mirror. The last element is required to maintain the focus on a fixed vertical slit when the grating subtended angle is changed in order to minimize the spectral defocusing aberration. The parameters of the focusing mirror are determined to introduce a coma that compensates for the coma given by the grating. The possibility of using two interchangeable gratings made the set-up optimized for a broad energy range of 12&#8722;50 eV. As a design test case, the set-up has been applied to a selection of the discrete spectral lines emitted by a gas-discharge lamp as the XUV source, obtaining a resolving power E/<inline-formula> <math display="inline"> <semantics> <mo>&#916;</mo> </semantics> </math> </inline-formula>E &gt; 3000.
topic high-order harmonic generation
ultrafast pulses
extreme ultraviolet
high resolution
monochromators
url https://www.mdpi.com/2076-3417/9/12/2502
work_keys_str_mv AT nicolafabris ahighresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses
AT paolomiotti ahighresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses
AT fabiofrassetto ahighresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses
AT lucapoletto ahighresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses
AT nicolafabris highresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses
AT paolomiotti highresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses
AT fabiofrassetto highresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses
AT lucapoletto highresolutionxuvgratingmonochromatorforthespectralselectionofultrashortharmonicpulses
_version_ 1725180627129466880