Influence of Deposition Temperature on the Phase Evolution of HfNbTiVZr High-Entropy Thin Films

In this study, we show that the phase formation of HfNbTiVZr high-entropy thin films is strongly influenced by the substrate temperature. Films deposited at room temperature exhibit an amorphous microstructure and are 6.5 GPa hard. With increasing substrate temperature (room temperature to 275 &...

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Bibliographic Details
Main Authors: Stefan Fritze, Christian M. Koller, Linus von Fieandt, Paulius Malinovskis, Kristina Johansson, Erik Lewin, Paul H. Mayrhofer, Ulf Jansson
Format: Article
Language:English
Published: MDPI AG 2019-02-01
Series:Materials
Subjects:
Online Access:https://www.mdpi.com/1996-1944/12/4/587
Description
Summary:In this study, we show that the phase formation of HfNbTiVZr high-entropy thin films is strongly influenced by the substrate temperature. Films deposited at room temperature exhibit an amorphous microstructure and are 6.5 GPa hard. With increasing substrate temperature (room temperature to 275 °C), a transition from an amorphous to a single-phased body-centred cubic (bcc) solid solution occurs, resulting in a hardness increase to 7.9 GPa. A higher deposition temperature (450 °C) leads to the formation of C14 or C15 Laves phase precipitates in the bcc matrix and a further enhancement of mechanical properties with a peak hardness value of 9.2 GPa. These results also show that thin films follow different phase formation pathways compared to HfNbTiVZr bulk alloys.
ISSN:1996-1944