Chemical Interactions and Their Role in the Microphase Separation of Block Copolymer Thin Films

The thermodynamics of self-assembling systems are discussed in terms of the chemical interactions and the intermolecular forces between species. It is clear that there are both theoretical and practical limitations on the dimensions and the structural regularity of these systems. These consideration...

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Main Authors: Richard A. Farrell, Thomas G. Fitzgerald, Dipu Borah, Justin D. Holmes, Michael A. Morris
Format: Article
Language:English
Published: MDPI AG 2009-08-01
Series:International Journal of Molecular Sciences
Subjects:
Online Access:http://www.mdpi.com/1422-0067/10/9/3671/
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spelling doaj-27828d1c09734ccdb2884db7af2f74002020-11-25T00:25:06ZengMDPI AGInternational Journal of Molecular Sciences1422-00672009-08-011093671371210.3390/ijms10093671Chemical Interactions and Their Role in the Microphase Separation of Block Copolymer Thin FilmsRichard A. FarrellThomas G. FitzgeraldDipu BorahJustin D. HolmesMichael A. MorrisThe thermodynamics of self-assembling systems are discussed in terms of the chemical interactions and the intermolecular forces between species. It is clear that there are both theoretical and practical limitations on the dimensions and the structural regularity of these systems. These considerations are made with reference to the microphase separation that occurs in block copolymer (BCP) systems. BCP systems self-assemble via a thermodynamic driven process where chemical dis-affinity between the blocks driving them part is balanced by a restorative force deriving from the chemical bond between the blocks. These systems are attracting much interest because of their possible role in nanoelectronic fabrication. This form of self-assembly can obtain highly regular nanopatterns in certain circumstances where the orientation and alignment of chemically distinct blocks can be guided through molecular interactions between the polymer and the surrounding interfaces. However, for this to be possible, great care must be taken to properly engineer the interactions between the surfaces and the polymer blocks. The optimum methods of structure directing are chemical pre-patterning (defining regions on the substrate of different chemistry) and graphoepitaxy (topographical alignment) but both centre on generating alignment through favourable chemical interactions. As in all self-assembling systems, the problems of defect formation must be considered and the origin of defects in these systems is explored. It is argued that in these nanostructures equilibrium defects are relatively few and largely originate from kinetic effects arising during film growth. Many defects also arise from the confinement of the systems when they are ‘directed’ by topography. The potential applications of these materials in electronics are discussed. http://www.mdpi.com/1422-0067/10/9/3671/block copolymerintermolecular forcesself-assemblyorderingstructural regularitythermodynamics
collection DOAJ
language English
format Article
sources DOAJ
author Richard A. Farrell
Thomas G. Fitzgerald
Dipu Borah
Justin D. Holmes
Michael A. Morris
spellingShingle Richard A. Farrell
Thomas G. Fitzgerald
Dipu Borah
Justin D. Holmes
Michael A. Morris
Chemical Interactions and Their Role in the Microphase Separation of Block Copolymer Thin Films
International Journal of Molecular Sciences
block copolymer
intermolecular forces
self-assembly
ordering
structural regularity
thermodynamics
author_facet Richard A. Farrell
Thomas G. Fitzgerald
Dipu Borah
Justin D. Holmes
Michael A. Morris
author_sort Richard A. Farrell
title Chemical Interactions and Their Role in the Microphase Separation of Block Copolymer Thin Films
title_short Chemical Interactions and Their Role in the Microphase Separation of Block Copolymer Thin Films
title_full Chemical Interactions and Their Role in the Microphase Separation of Block Copolymer Thin Films
title_fullStr Chemical Interactions and Their Role in the Microphase Separation of Block Copolymer Thin Films
title_full_unstemmed Chemical Interactions and Their Role in the Microphase Separation of Block Copolymer Thin Films
title_sort chemical interactions and their role in the microphase separation of block copolymer thin films
publisher MDPI AG
series International Journal of Molecular Sciences
issn 1422-0067
publishDate 2009-08-01
description The thermodynamics of self-assembling systems are discussed in terms of the chemical interactions and the intermolecular forces between species. It is clear that there are both theoretical and practical limitations on the dimensions and the structural regularity of these systems. These considerations are made with reference to the microphase separation that occurs in block copolymer (BCP) systems. BCP systems self-assemble via a thermodynamic driven process where chemical dis-affinity between the blocks driving them part is balanced by a restorative force deriving from the chemical bond between the blocks. These systems are attracting much interest because of their possible role in nanoelectronic fabrication. This form of self-assembly can obtain highly regular nanopatterns in certain circumstances where the orientation and alignment of chemically distinct blocks can be guided through molecular interactions between the polymer and the surrounding interfaces. However, for this to be possible, great care must be taken to properly engineer the interactions between the surfaces and the polymer blocks. The optimum methods of structure directing are chemical pre-patterning (defining regions on the substrate of different chemistry) and graphoepitaxy (topographical alignment) but both centre on generating alignment through favourable chemical interactions. As in all self-assembling systems, the problems of defect formation must be considered and the origin of defects in these systems is explored. It is argued that in these nanostructures equilibrium defects are relatively few and largely originate from kinetic effects arising during film growth. Many defects also arise from the confinement of the systems when they are ‘directed’ by topography. The potential applications of these materials in electronics are discussed.
topic block copolymer
intermolecular forces
self-assembly
ordering
structural regularity
thermodynamics
url http://www.mdpi.com/1422-0067/10/9/3671/
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