Low-Loss Singlemode PECVD Silicon Nitride Photonic Wire Waveguides for 532–900 nm Wavelength Window Fabricated Within a CMOS Pilot Line

Low-Loss Singlemode PECVD Silicon Nitride Photonic Wire Waveguides for 532–900 nm Wavelength Window Fabricated Within a CMOS Pilot Line

PECVD silicon nitride photonic wire waveguides have been fabricated in a CMOS pilot line. Both clad and unclad single mode wire waveguides were measured at λ = 532, 780, and 900 nm, respectively. The dependence of loss on wire width, wavelength, and cladding is discussed in detail. Cladde...

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Bibliographic Details
Main Authors: A. Z. Subramanian, P. Neutens, A. Dhakal, R. Jansen, T. Claes, X. Rottenberg, F. Peyskens, S. Selvaraja, P. Helin, B. DuBois, K. Leyssens, S. Severi, P. Deshpande, R. Baets, P. Van Dorpe
Format: Article
Language:English
Published: IEEE 2013-01-01
Series:IEEE Photonics Journal
Subjects:
Waveguides
waveguide devices
fabrication and characterization
photonic materials
gratings
Online Access:https://ieeexplore.ieee.org/document/6674990/

Internet

https://ieeexplore.ieee.org/document/6674990/

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