Synthesis, Characterization, and Photocatalytic Evaluation of Manganese (III) Phthalocyanine Sensitized ZnWO₄ (ZnWO₄MnPc) for Bisphenol A Degradation under UV Irradiation

• Main Authors: Chukwuka Bethel Anucha, Ilknur Altin, Zekeriya Biyiklioglu, Emin Bacaksiz, Ismail Polat, Vassilis N. Stathopoulos
• Format: Article
• Language: English
• Published: MDPI AG 2020-10-01
• Series: Nanomaterials
• Subjects: photocatalysis; hydrothermal autoclave; ZnWO₄; manganese (III) phthalocyanine sensitized ZnWO₄ photocatalyst; emerging contaminants; bisphenol A
• Online Access: https://www.mdpi.com/2079-4991/10/11/2139

ZnWO₄MnPc was synthesized via a hydrothermal autoclave method with 1 wt.% manganese (iii) phthalocyanine content. The material was characterized for its structural and morphological features via X-ray diffraction (XRD) spectroscopy, Fourier transform infrared (FTIR) spectroscopy, transmission emission microscopy (TEM), scanning electron microscopy-Energy dispersive X-ray spectroscopy (SEM-EDX), N₂ adsorption–desorption at 77K, X-ray photoelectron spectroscopy (XPS), and UV-visible/diffuse reflectance spectroscopy(UV-vis/DRS). ZnWO₄MnPc photocatalytic performance was tested on the degradation of bisphenol A (BPA). The ZnWO₄MnPc material removed 60% of BPA after 4 h of 365 nm UV irradiation. Degradation process improved significantly to about 80% removal in the presence of added 5 mM H₂O₂ after 4 h irradiation. Almost 100% removal was achieved after 30 min under 450 nm visible light irradiation in the presence of same concentration of H₂O₂. The effect of ions and humic acid (HA) towards BPA removal was also investigated.