Magnetic Resonance Lithography with Nanometer Resolution

Magnetic Resonance Lithography with Nanometer Resolution

We propose an approach for super-resolution optical lithography which is based on the inverse of magnetic resonance imaging (MRI). The technique uses atomic coherence in an ensemble of spin systems whose final state population can be optically detected. In principle, our method is capable of produci...

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Main Authors: Fahad AlGhannam, Philip Hemmer, Zeyang Liao, M. Suhail Zubairy
Format: Article
Language:English
Published: MDPI AG 2016-04-01
Series:Technologies
Subjects:
superresolution
subwavelength lithography
NMR imaging
optically detected magnetic resonance
Online Access:http://www.mdpi.com/2227-7080/4/2/12
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spelling doaj-3357597766ca4fb6b0a460e5437f55a62020-11-24T20:42:57ZengMDPI AGTechnologies2227-70802016-04-01421210.3390/technologies4020012technologies4020012Magnetic Resonance Lithography with Nanometer ResolutionFahad AlGhannam0Philip Hemmer1Zeyang Liao2M. Suhail Zubairy3Institute for Quantum Science and Engineering (IQSE) and Department of Physics and Astronomy, Texas A&M University, College Station, TX 77843-4242, USADepartment of Electrical & Computer Engineering, Texas A&M University, College Station, TX 77843-4242, USAInstitute for Quantum Science and Engineering (IQSE) and Department of Physics and Astronomy, Texas A&M University, College Station, TX 77843-4242, USAInstitute for Quantum Science and Engineering (IQSE) and Department of Physics and Astronomy, Texas A&M University, College Station, TX 77843-4242, USAWe propose an approach for super-resolution optical lithography which is based on the inverse of magnetic resonance imaging (MRI). The technique uses atomic coherence in an ensemble of spin systems whose final state population can be optically detected. In principle, our method is capable of producing arbitrary one and two dimensional high-resolution patterns with high contrast.http://www.mdpi.com/2227-7080/4/2/12superresolutionsubwavelength lithographyNMR imagingoptically detected magnetic resonance
collection DOAJ
language English
format Article
sources DOAJ
author Fahad AlGhannam
Philip Hemmer
Zeyang Liao
M. Suhail Zubairy
spellingShingle Fahad AlGhannam
Philip Hemmer
Zeyang Liao
M. Suhail Zubairy
Magnetic Resonance Lithography with Nanometer Resolution
Technologies
superresolution
subwavelength lithography
NMR imaging
optically detected magnetic resonance
author_facet Fahad AlGhannam
Philip Hemmer
Zeyang Liao
M. Suhail Zubairy
author_sort Fahad AlGhannam
title Magnetic Resonance Lithography with Nanometer Resolution
title_short Magnetic Resonance Lithography with Nanometer Resolution
title_full Magnetic Resonance Lithography with Nanometer Resolution
title_fullStr Magnetic Resonance Lithography with Nanometer Resolution
title_full_unstemmed Magnetic Resonance Lithography with Nanometer Resolution
title_sort magnetic resonance lithography with nanometer resolution
publisher MDPI AG
series Technologies
issn 2227-7080
publishDate 2016-04-01
description We propose an approach for super-resolution optical lithography which is based on the inverse of magnetic resonance imaging (MRI). The technique uses atomic coherence in an ensemble of spin systems whose final state population can be optically detected. In principle, our method is capable of producing arbitrary one and two dimensional high-resolution patterns with high contrast.
topic superresolution
subwavelength lithography
NMR imaging
optically detected magnetic resonance
url http://www.mdpi.com/2227-7080/4/2/12
work_keys_str_mv AT fahadalghannam magneticresonancelithographywithnanometerresolution
AT philiphemmer magneticresonancelithographywithnanometerresolution
AT zeyangliao magneticresonancelithographywithnanometerresolution
AT msuhailzubairy magneticresonancelithographywithnanometerresolution
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