Photoelectrochemical Water Splitting Properties of Ti-Ni-Si-O Nanostructures on Ti-Ni-Si Alloy
Ti-Ni-Si-O nanostructures were successfully prepared on Ti-1Ni-5Si alloy foils via electrochemical anodization in ethylene glycol/glycerol solutions containing a small amount of water. The Ti-Ni-Si-O nanostructures were characterized by field-emission scanning electron microscopy (FE-SEM), energy di...
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doaj-34665bbb271e4c4b9e75daa18184e6c02020-11-25T00:38:54ZengMDPI AGNanomaterials2079-49912017-10-0171135910.3390/nano7110359nano7110359Photoelectrochemical Water Splitting Properties of Ti-Ni-Si-O Nanostructures on Ti-Ni-Si AlloyTing Li0Dongyan Ding1Zhenbiao Dong2Congqin Ning3Institute of Electronic Materials and Technology, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240, ChinaInstitute of Electronic Materials and Technology, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240, ChinaInstitute of Electronic Materials and Technology, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240, ChinaState Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, ChinaTi-Ni-Si-O nanostructures were successfully prepared on Ti-1Ni-5Si alloy foils via electrochemical anodization in ethylene glycol/glycerol solutions containing a small amount of water. The Ti-Ni-Si-O nanostructures were characterized by field-emission scanning electron microscopy (FE-SEM), energy dispersive spectroscopy (EDS), X-ray diffraction (XRD), and diffuse reflectance absorption spectra. Furthermore, the photoelectrochemical water splitting properties of the Ti-Ni-Si-O nanostructure films were investigated. It was found that, after anodization, three different kinds of Ti-Ni-Si-O nanostructures formed in the α-Ti phase region, Ti2Ni phase region, and Ti5Si3 phase region of the alloy surface. Both the anatase and rutile phases of Ti-Ni-Si-O oxide appeared after annealing at 500 °C for 2 h. The photocurrent density obtained from the Ti-Ni-Si-O nanostructure photoanodes was 0.45 mA/cm2 at 0 V (vs. Ag/AgCl) in 1 M KOH solution. The above findings make it feasible to further explore excellent photoelectrochemical properties of the nanostructure-modified surface of Ti-Ni-Si ternary alloys.https://www.mdpi.com/2079-4991/7/11/359anodizationTiO2 nanostructuredopingphotoelectrochemical water splitting |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Ting Li Dongyan Ding Zhenbiao Dong Congqin Ning |
spellingShingle |
Ting Li Dongyan Ding Zhenbiao Dong Congqin Ning Photoelectrochemical Water Splitting Properties of Ti-Ni-Si-O Nanostructures on Ti-Ni-Si Alloy Nanomaterials anodization TiO2 nanostructure doping photoelectrochemical water splitting |
author_facet |
Ting Li Dongyan Ding Zhenbiao Dong Congqin Ning |
author_sort |
Ting Li |
title |
Photoelectrochemical Water Splitting Properties of Ti-Ni-Si-O Nanostructures on Ti-Ni-Si Alloy |
title_short |
Photoelectrochemical Water Splitting Properties of Ti-Ni-Si-O Nanostructures on Ti-Ni-Si Alloy |
title_full |
Photoelectrochemical Water Splitting Properties of Ti-Ni-Si-O Nanostructures on Ti-Ni-Si Alloy |
title_fullStr |
Photoelectrochemical Water Splitting Properties of Ti-Ni-Si-O Nanostructures on Ti-Ni-Si Alloy |
title_full_unstemmed |
Photoelectrochemical Water Splitting Properties of Ti-Ni-Si-O Nanostructures on Ti-Ni-Si Alloy |
title_sort |
photoelectrochemical water splitting properties of ti-ni-si-o nanostructures on ti-ni-si alloy |
publisher |
MDPI AG |
series |
Nanomaterials |
issn |
2079-4991 |
publishDate |
2017-10-01 |
description |
Ti-Ni-Si-O nanostructures were successfully prepared on Ti-1Ni-5Si alloy foils via electrochemical anodization in ethylene glycol/glycerol solutions containing a small amount of water. The Ti-Ni-Si-O nanostructures were characterized by field-emission scanning electron microscopy (FE-SEM), energy dispersive spectroscopy (EDS), X-ray diffraction (XRD), and diffuse reflectance absorption spectra. Furthermore, the photoelectrochemical water splitting properties of the Ti-Ni-Si-O nanostructure films were investigated. It was found that, after anodization, three different kinds of Ti-Ni-Si-O nanostructures formed in the α-Ti phase region, Ti2Ni phase region, and Ti5Si3 phase region of the alloy surface. Both the anatase and rutile phases of Ti-Ni-Si-O oxide appeared after annealing at 500 °C for 2 h. The photocurrent density obtained from the Ti-Ni-Si-O nanostructure photoanodes was 0.45 mA/cm2 at 0 V (vs. Ag/AgCl) in 1 M KOH solution. The above findings make it feasible to further explore excellent photoelectrochemical properties of the nanostructure-modified surface of Ti-Ni-Si ternary alloys. |
topic |
anodization TiO2 nanostructure doping photoelectrochemical water splitting |
url |
https://www.mdpi.com/2079-4991/7/11/359 |
work_keys_str_mv |
AT tingli photoelectrochemicalwatersplittingpropertiesoftinisionanostructuresontinisialloy AT dongyanding photoelectrochemicalwatersplittingpropertiesoftinisionanostructuresontinisialloy AT zhenbiaodong photoelectrochemicalwatersplittingpropertiesoftinisionanostructuresontinisialloy AT congqinning photoelectrochemicalwatersplittingpropertiesoftinisionanostructuresontinisialloy |
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1725295894568370176 |