Microstructure and Magnetic Properties of NdFeB Films through Nd Surface Diffusion Process

Ta/Nd/NdFeB/Nd/Ta films were deposited by magnetron sputtering on Si (100) substrates and subsequently annealed for 30 min at 923 K in vacuum. It was found that the microstructure and magnetic properties of Ta/Nd/NdFeB/Nd/Ta films strongly depend on the NdFeB layer thickness. With NdFeB layer thickn...

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Bibliographic Details
Main Authors: Wenfeng Liu, Mingang Zhang, Kewei Zhang, Yuesheng Chai
Format: Article
Language:English
Published: Hindawi Limited 2017-01-01
Series:Advances in Condensed Matter Physics
Online Access:http://dx.doi.org/10.1155/2017/4296243

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