Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films
Technological methods and conditions for additional inorganic dielectric films formation using the vacuum deposition on nanostructured porous alumina bases are investigated. Modified multilayer structures with closed porosity have been obtained. The improvement of thermophysical and electrophysical...
Main Author: | |
---|---|
Format: | Article |
Language: | Russian |
Published: |
Tver State University
2017-12-01
|
Series: | Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов |
Subjects: | |
Online Access: | http://physchemaspects.ru/archives/2017/fh2017-doi-10-26456-pcascnn-2017-9-529.pdf |
id |
doaj-37245e64c0ab431e8b53b09cf14641a6 |
---|---|
record_format |
Article |
spelling |
doaj-37245e64c0ab431e8b53b09cf14641a62020-11-25T02:20:47ZrusTver State UniversityФизико-химические аспекты изучения кластеров, наноструктур и наноматериалов2226-44422658-43602017-12-01952953510.26456/pcascnn/2017.9.529Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric filmsD.L. Shimanovich0Belarusian State University of Informatics and RadioelectronicsTechnological methods and conditions for additional inorganic dielectric films formation using the vacuum deposition on nanostructured porous alumina bases are investigated. Modified multilayer structures with closed porosity have been obtained. The improvement of thermophysical and electrophysical properties of finite dielectric coatings on aluminum substrates is demonstrated.http://physchemaspects.ru/archives/2017/fh2017-doi-10-26456-pcascnn-2017-9-529.pdfaluminumelectrochemical anodizationporous anode aluminananostructured materialvacuum depositionthermophysical and electrophysical properties |
collection |
DOAJ |
language |
Russian |
format |
Article |
sources |
DOAJ |
author |
D.L. Shimanovich |
spellingShingle |
D.L. Shimanovich Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов aluminum electrochemical anodization porous anode alumina nanostructured material vacuum deposition thermophysical and electrophysical properties |
author_facet |
D.L. Shimanovich |
author_sort |
D.L. Shimanovich |
title |
Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films |
title_short |
Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films |
title_full |
Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films |
title_fullStr |
Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films |
title_full_unstemmed |
Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films |
title_sort |
technological approaches for modified multilayer coatings formation based on nanostructured porous anodic al2o3 and deposited dielectric films |
publisher |
Tver State University |
series |
Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов |
issn |
2226-4442 2658-4360 |
publishDate |
2017-12-01 |
description |
Technological methods and conditions for additional inorganic dielectric films formation using the vacuum deposition on nanostructured porous alumina bases are investigated. Modified multilayer structures with closed porosity have been obtained. The improvement of thermophysical and electrophysical properties of finite dielectric coatings on aluminum substrates is demonstrated. |
topic |
aluminum electrochemical anodization porous anode alumina nanostructured material vacuum deposition thermophysical and electrophysical properties |
url |
http://physchemaspects.ru/archives/2017/fh2017-doi-10-26456-pcascnn-2017-9-529.pdf |
work_keys_str_mv |
AT dlshimanovich technologicalapproachesformodifiedmultilayercoatingsformationbasedonnanostructuredporousanodical2o3anddepositeddielectricfilms |
_version_ |
1724869828911562752 |