Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films

Technological methods and conditions for additional inorganic dielectric films formation using the vacuum deposition on nanostructured porous alumina bases are investigated. Modified multilayer structures with closed porosity have been obtained. The improvement of thermophysical and electrophysical...

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Main Author: D.L. Shimanovich
Format: Article
Language:Russian
Published: Tver State University 2017-12-01
Series:Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов
Subjects:
Online Access:http://physchemaspects.ru/archives/2017/fh2017-doi-10-26456-pcascnn-2017-9-529.pdf
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spelling doaj-37245e64c0ab431e8b53b09cf14641a62020-11-25T02:20:47ZrusTver State UniversityФизико-химические аспекты изучения кластеров, наноструктур и наноматериалов2226-44422658-43602017-12-01952953510.26456/pcascnn/2017.9.529Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric filmsD.L. Shimanovich0Belarusian State University of Informatics and RadioelectronicsTechnological methods and conditions for additional inorganic dielectric films formation using the vacuum deposition on nanostructured porous alumina bases are investigated. Modified multilayer structures with closed porosity have been obtained. The improvement of thermophysical and electrophysical properties of finite dielectric coatings on aluminum substrates is demonstrated.http://physchemaspects.ru/archives/2017/fh2017-doi-10-26456-pcascnn-2017-9-529.pdfaluminumelectrochemical anodizationporous anode aluminananostructured materialvacuum depositionthermophysical and electrophysical properties
collection DOAJ
language Russian
format Article
sources DOAJ
author D.L. Shimanovich
spellingShingle D.L. Shimanovich
Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films
Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов
aluminum
electrochemical anodization
porous anode alumina
nanostructured material
vacuum deposition
thermophysical and electrophysical properties
author_facet D.L. Shimanovich
author_sort D.L. Shimanovich
title Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films
title_short Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films
title_full Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films
title_fullStr Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films
title_full_unstemmed Technological approaches for modified multilayer coatings formation based on nanostructured porous anodic Al2O3 and deposited dielectric films
title_sort technological approaches for modified multilayer coatings formation based on nanostructured porous anodic al2o3 and deposited dielectric films
publisher Tver State University
series Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов
issn 2226-4442
2658-4360
publishDate 2017-12-01
description Technological methods and conditions for additional inorganic dielectric films formation using the vacuum deposition on nanostructured porous alumina bases are investigated. Modified multilayer structures with closed porosity have been obtained. The improvement of thermophysical and electrophysical properties of finite dielectric coatings on aluminum substrates is demonstrated.
topic aluminum
electrochemical anodization
porous anode alumina
nanostructured material
vacuum deposition
thermophysical and electrophysical properties
url http://physchemaspects.ru/archives/2017/fh2017-doi-10-26456-pcascnn-2017-9-529.pdf
work_keys_str_mv AT dlshimanovich technologicalapproachesformodifiedmultilayercoatingsformationbasedonnanostructuredporousanodical2o3anddepositeddielectricfilms
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