Analysis of microleakage and marginal gap presented by new polymeric systems in class V restorations: An in vitro study

Objective: Evaluating the contraction of polymerization effect of silorane-based composite on dental interface in enamel. Materials and Methods: Eighty class V cavities were confectioned in forty extracted molar teeth and restored with different combinations of resinous-based and bond system. They w...

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Bibliographic Details
Main Authors: Jefferson Ricardo Pereira, Hugo Alberto Vidotti, Lindomar Corrêa Júnior, Alef Vermudt, Mauro de Souza Almeida, Saulo Pamato
Format: Article
Language:English
Published: Elsevier 2021-03-01
Series:Saudi Dental Journal
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Online Access:http://www.sciencedirect.com/science/article/pii/S1013905219306935
Description
Summary:Objective: Evaluating the contraction of polymerization effect of silorane-based composite on dental interface in enamel. Materials and Methods: Eighty class V cavities were confectioned in forty extracted molar teeth and restored with different combinations of resinous-based and bond system. They were divided into the following groups: (G1) three-step etch-and-rinse adhesive system and methacrylate-based resin, (G2) two-step etch-and-rinse adhesive system and methacrylate-based resin, (G3) Filtek P-90 self-conditioning adhesive system and methacrylate-based resin, (G4) Adper SE Plus self-conditioning adhesive system and methacrylate-based resin, (G5) three-step etch-and-rinse adhesive system and silorane-based resin, (G6) two-step etch-and-rinse adhesive system and silorane-based resin, (G7) Filtek P-90 self-conditioning adhesive system and silorane-based resin, (G8) Adper SE Plus self-conditioning adhesive system and silorane-based resin. Results: Group 7 showed lower marginal leakage when compared with all other groups (p = 0.001). Conclusions: The results allows suggesting that silorane-based resinous system is adequate to promote more satisfactory marginal sealing than any other combination, since the system is combined with its own bond system.
ISSN:1013-9052