Enhancement on the Surface Hydrophobicity and Oleophobicity of an Organosilicon Film by Conformity Deposition and Surface Fluorination Etching
In this work, the surface morphology of a hydrophobic organosilicon film was modified as it was deposited onto a silver seed layer with nanoparticles. The surface hydrophobicity evaluated by the water contact angle was significantly increased from 100° to 128° originating from the su...
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doaj-407d952cc9b04071a3ec8a7ab04531692020-11-25T01:57:21ZengMDPI AGMaterials1996-19442018-06-01117108910.3390/ma11071089ma11071089Enhancement on the Surface Hydrophobicity and Oleophobicity of an Organosilicon Film by Conformity Deposition and Surface Fluorination EtchingZheng-Wen Xu0Yu-Kai Zhang1Tai-Hong Chen2Jin-How Chang3Tsung-Hsin Lee4Pei-Yu Li5Day-Shan Liu6Institute of Electro-Optical and Material Science, National Formosa University, 63201 Yunlin, TaiwanInstitute of Electro-Optical and Material Science, National Formosa University, 63201 Yunlin, TaiwanAdditive Manufacturing and Laser Application, Industrial Technology Research Institute, 73445 Tainan, TaiwanAdditive Manufacturing and Laser Application, Industrial Technology Research Institute, 73445 Tainan, TaiwanMetal Industries Research & Development Centre, 82151 Kaohsiung, TaiwanInstitute of Electro-Optical and Material Science, National Formosa University, 63201 Yunlin, TaiwanInstitute of Electro-Optical and Material Science, National Formosa University, 63201 Yunlin, TaiwanIn this work, the surface morphology of a hydrophobic organosilicon film was modified as it was deposited onto a silver seed layer with nanoparticles. The surface hydrophobicity evaluated by the water contact angle was significantly increased from 100° to 128° originating from the surface of the organosilicon film becoming roughened, and was deeply relevant to the Ag seed layer conform deposition. In addition, the organosilicon film became surface oleophobic and the surface hydrophobicity was improved due to the formation of the inactive C-F chemical on the surface after the carbon tetrafluoride glow discharge etching. The surface hydrophobicity and oleophobicity of the organosilicon film could be further optimized with water and oleic contact angles of about 138° and 61°, respectively, after an adequate fluorination etching.http://www.mdpi.com/1996-1944/11/7/1089organosilicon filmsilver seed layerconformity depositionhydrophobicityoleophobicityfluorination etching |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Zheng-Wen Xu Yu-Kai Zhang Tai-Hong Chen Jin-How Chang Tsung-Hsin Lee Pei-Yu Li Day-Shan Liu |
spellingShingle |
Zheng-Wen Xu Yu-Kai Zhang Tai-Hong Chen Jin-How Chang Tsung-Hsin Lee Pei-Yu Li Day-Shan Liu Enhancement on the Surface Hydrophobicity and Oleophobicity of an Organosilicon Film by Conformity Deposition and Surface Fluorination Etching Materials organosilicon film silver seed layer conformity deposition hydrophobicity oleophobicity fluorination etching |
author_facet |
Zheng-Wen Xu Yu-Kai Zhang Tai-Hong Chen Jin-How Chang Tsung-Hsin Lee Pei-Yu Li Day-Shan Liu |
author_sort |
Zheng-Wen Xu |
title |
Enhancement on the Surface Hydrophobicity and Oleophobicity of an Organosilicon Film by Conformity Deposition and Surface Fluorination Etching |
title_short |
Enhancement on the Surface Hydrophobicity and Oleophobicity of an Organosilicon Film by Conformity Deposition and Surface Fluorination Etching |
title_full |
Enhancement on the Surface Hydrophobicity and Oleophobicity of an Organosilicon Film by Conformity Deposition and Surface Fluorination Etching |
title_fullStr |
Enhancement on the Surface Hydrophobicity and Oleophobicity of an Organosilicon Film by Conformity Deposition and Surface Fluorination Etching |
title_full_unstemmed |
Enhancement on the Surface Hydrophobicity and Oleophobicity of an Organosilicon Film by Conformity Deposition and Surface Fluorination Etching |
title_sort |
enhancement on the surface hydrophobicity and oleophobicity of an organosilicon film by conformity deposition and surface fluorination etching |
publisher |
MDPI AG |
series |
Materials |
issn |
1996-1944 |
publishDate |
2018-06-01 |
description |
In this work, the surface morphology of a hydrophobic organosilicon film was modified as it was deposited onto a silver seed layer with nanoparticles. The surface hydrophobicity evaluated by the water contact angle was significantly increased from 100° to 128° originating from the surface of the organosilicon film becoming roughened, and was deeply relevant to the Ag seed layer conform deposition. In addition, the organosilicon film became surface oleophobic and the surface hydrophobicity was improved due to the formation of the inactive C-F chemical on the surface after the carbon tetrafluoride glow discharge etching. The surface hydrophobicity and oleophobicity of the organosilicon film could be further optimized with water and oleic contact angles of about 138° and 61°, respectively, after an adequate fluorination etching. |
topic |
organosilicon film silver seed layer conformity deposition hydrophobicity oleophobicity fluorination etching |
url |
http://www.mdpi.com/1996-1944/11/7/1089 |
work_keys_str_mv |
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1724974610435276800 |