Effect of Boron Doping on Diamond Film and Electrochemical Properties of BDD According to Thickness and Morphology

• Main Authors: Chang Weon Song, Dae Seung Cho, Jae Myung Lee, Pung Keun Song
• Format: Article
• Language: English
• Published: MDPI AG 2020-03-01
• Series: Coatings
• Subjects: HFCVD; diamond; BDD; electrochemical properties; CV curve
• Online Access: https://www.mdpi.com/2079-6412/10/4/331

Diamond coating using hot-filament chemical vapor deposition (HFCVD) is now widely used in many fields. The quality of the diamond film and many factors determine the success of the coating, such as temperature, time, and pressure during coating. The purpose of this study was to produce coated boron-doped diamond (BDD) films by doping boron in the diamond film and to assess them through comparative analysis with foreign acid BDD, which is widely used as a water-treatment electrode in the present industry. The bending of the titanium substrate due to the high temperature during the diamond deposition was avoided by adding an intermediate layer with a columnar structure to niobium film. The filament temperature and pressure were determined through preliminary experiments, and BDD films were coated. The BDD film deposition rate was confirmed to be 100 nm/h, and the potential window increased with increasing thickness. The electrochemical activation and catalytic performance were confirmed according to the surface characteristics. Although the high deposition rate of the BDD coating is also an important factor, it was confirmed that conducting coating so that amorphous carbonization does not occur by controlling the temperature during coating can improve the electrochemical properties of BDD film.