Collective laser‐assisted bonding process for 3D TSV integration with NCP
Laser‐assisted bonding (LAB) is an advanced technology in which a homogenized laser beam is selectively applied to a chip. Previous researches have demonstrated the feasibility of using a single‐tier LAB process for 3D through‐silicon via (TSV) integration with nonconductive paste (NCP), where each...
Main Authors: | Wagno Alves Braganca, Yong‐Sung Eom, Keon‐Soo Jang, Seok Hwan Moon, Hyun‐Cheol Bae, Kwang‐Seong Choi |
---|---|
Format: | Article |
Language: | English |
Published: |
Electronics and Telecommunications Research Institute (ETRI)
2019-04-01
|
Series: | ETRI Journal |
Subjects: | |
Online Access: | https://doi.org/10.4218/etrij.2018-0171 |
Similar Items
-
Metal Filling of Through Silicon Vias (TSVs) using Wire Bonding Technology
by: Wennergren, Karl Fredrik
Published: (2014) -
iPseU-NCP: Identifying RNA pseudouridine sites using random forest and NCP-encoded features
by: Thanh-Hoang Nguyen-Vo, et al.
Published: (2019-12-01) -
Virtualization-Based Efficient TSV Repair for 3-D Integrated Circuits
by: Muhammad Imran, et al.
Published: (2020-01-01) -
A review on TSV reliability
by: Wang Shuo, et al.
Published: (2021-02-01) -
Electrical and Mechanical Analysis of Different TSV Geometries
by: Il Ho Jeong, et al.
Published: (2020-04-01)