Dielectric properties of amorphous Zr–Al–O and Zr-Si-O thin films

We have systematically studied the composition dependence of the dielectric properties of Zr1-xAlxO2-x/2 and Zr1-xSixO2. An essentially linear variation of the static dielectric constant, εs, was observed as a function of composition, x, for compositions rich in the p-block element, i.e., x > 0.4...

Full description

Bibliographic Details
Main Authors: T. A. Naoi, Hanjong Paik, M. L. Green, R. B. van Dover
Format: Article
Language:English
Published: World Scientific Publishing 2015-03-01
Series:Journal of Advanced Dielectrics
Subjects:
Online Access:http://www.worldscientific.com/doi/pdf/10.1142/S2010135X15500101
id doaj-4b8117c60a4f4ebf866ec534e3404b0f
record_format Article
spelling doaj-4b8117c60a4f4ebf866ec534e3404b0f2020-11-24T22:09:24ZengWorld Scientific PublishingJournal of Advanced Dielectrics2010-135X2010-13682015-03-01511550010-11550010-810.1142/S2010135X1550010110.1142/S2010135X15500101Dielectric properties of amorphous Zr–Al–O and Zr-Si-O thin filmsT. A. Naoi0Hanjong Paik1M. L. Green2R. B. van Dover3Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USADepartment of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USANational Institute of Standards and Technology, Gaithersburg, Maryland 20899, USADepartment of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USAWe have systematically studied the composition dependence of the dielectric properties of Zr1-xAlxO2-x/2 and Zr1-xSixO2. An essentially linear variation of the static dielectric constant, εs, was observed as a function of composition, x, for compositions rich in the p-block element, i.e., x > 0.4, for both chemical systems. However an abrupt change in εs is found near x ≈ 0.35, associated with the onset of crystallinity in as-deposited films. Breakdown fields do not show a comparable composition dependence. Measurements of the index of refraction at optical frequencies, combined with a simple Clausius–Mossotti interpretation, indicates that low-frequency (ionic) contributions to the polarizability exhibit systematic deviation with respect to values linearly interpolated from the endmembers. These trends are not consistently affected by the presence of crystalline order, but are related to changes associated with heterogeneous local oxygen coordination and bonding.http://www.worldscientific.com/doi/pdf/10.1142/S2010135X15500101Permitivittyamorphouszirconia
collection DOAJ
language English
format Article
sources DOAJ
author T. A. Naoi
Hanjong Paik
M. L. Green
R. B. van Dover
spellingShingle T. A. Naoi
Hanjong Paik
M. L. Green
R. B. van Dover
Dielectric properties of amorphous Zr–Al–O and Zr-Si-O thin films
Journal of Advanced Dielectrics
Permitivitty
amorphous
zirconia
author_facet T. A. Naoi
Hanjong Paik
M. L. Green
R. B. van Dover
author_sort T. A. Naoi
title Dielectric properties of amorphous Zr–Al–O and Zr-Si-O thin films
title_short Dielectric properties of amorphous Zr–Al–O and Zr-Si-O thin films
title_full Dielectric properties of amorphous Zr–Al–O and Zr-Si-O thin films
title_fullStr Dielectric properties of amorphous Zr–Al–O and Zr-Si-O thin films
title_full_unstemmed Dielectric properties of amorphous Zr–Al–O and Zr-Si-O thin films
title_sort dielectric properties of amorphous zr–al–o and zr-si-o thin films
publisher World Scientific Publishing
series Journal of Advanced Dielectrics
issn 2010-135X
2010-1368
publishDate 2015-03-01
description We have systematically studied the composition dependence of the dielectric properties of Zr1-xAlxO2-x/2 and Zr1-xSixO2. An essentially linear variation of the static dielectric constant, εs, was observed as a function of composition, x, for compositions rich in the p-block element, i.e., x > 0.4, for both chemical systems. However an abrupt change in εs is found near x ≈ 0.35, associated with the onset of crystallinity in as-deposited films. Breakdown fields do not show a comparable composition dependence. Measurements of the index of refraction at optical frequencies, combined with a simple Clausius–Mossotti interpretation, indicates that low-frequency (ionic) contributions to the polarizability exhibit systematic deviation with respect to values linearly interpolated from the endmembers. These trends are not consistently affected by the presence of crystalline order, but are related to changes associated with heterogeneous local oxygen coordination and bonding.
topic Permitivitty
amorphous
zirconia
url http://www.worldscientific.com/doi/pdf/10.1142/S2010135X15500101
work_keys_str_mv AT tanaoi dielectricpropertiesofamorphouszraloandzrsiothinfilms
AT hanjongpaik dielectricpropertiesofamorphouszraloandzrsiothinfilms
AT mlgreen dielectricpropertiesofamorphouszraloandzrsiothinfilms
AT rbvandover dielectricpropertiesofamorphouszraloandzrsiothinfilms
_version_ 1725812111517417472