Analysis of the Release Characteristics of Cu-Treated Antimicrobial Implant Surfaces Using Atomic Absorption Spectrometry
New developments of antimicrobial implant surfaces doped with copper (Cu) ions may minimize the risk of implant-associated infections. However, experimental evaluation of the Cu release is influenced by various test parameters. The aim of our study was to evaluate the Cu release characteristics in v...
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Series: | Bioinorganic Chemistry and Applications |
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doaj-5807067460bd4fc4a0be8346b1f7d54f2020-11-24T23:07:40ZengHindawi LimitedBioinorganic Chemistry and Applications1565-36331687-479X2012-01-01201210.1155/2012/850390850390Analysis of the Release Characteristics of Cu-Treated Antimicrobial Implant Surfaces Using Atomic Absorption SpectrometryCarmen Zietz0Andreas Fritsche1Birgit Finke2Vitezslav Stranak3Maximilian Haenle4Rainer Hippler5Wolfram Mittelmeier6Rainer Bader7Biomechanics and Implant Technology Research Laboratory, Department of Orhtopeadics, University of Rostock, Doberaner Straβe 142, 18057 Rostock, GermanyBiomechanics and Implant Technology Research Laboratory, Department of Orhtopeadics, University of Rostock, Doberaner Straβe 142, 18057 Rostock, GermanyLeibniz Institute for Plasma Science and Technology (INP e.V. Greifswald), Felix-Hausdorff-Straβe 2, 17489 Greifswald, GermanyInstitute of Physics, Ernst-Moritz-Arndt University of Greifswald, Felix-Hausdorff-Straβe 6, 17487 Greifswald, GermanyBiomechanics and Implant Technology Research Laboratory, Department of Orhtopeadics, University of Rostock, Doberaner Straβe 142, 18057 Rostock, GermanyInstitute of Physics, Ernst-Moritz-Arndt University of Greifswald, Felix-Hausdorff-Straβe 6, 17487 Greifswald, GermanyBiomechanics and Implant Technology Research Laboratory, Department of Orhtopeadics, University of Rostock, Doberaner Straβe 142, 18057 Rostock, GermanyBiomechanics and Implant Technology Research Laboratory, Department of Orhtopeadics, University of Rostock, Doberaner Straβe 142, 18057 Rostock, GermanyNew developments of antimicrobial implant surfaces doped with copper (Cu) ions may minimize the risk of implant-associated infections. However, experimental evaluation of the Cu release is influenced by various test parameters. The aim of our study was to evaluate the Cu release characteristics in vitro according to the storage fluid and surface roughness. Plasma immersion ion implantation of Cu (Cu-PIII) and pulsed magnetron sputtering process of a titanium copper film (Ti-Cu) were applied to titanium alloy (Ti6Al4V) samples with different surface finishing of the implant material (polished, hydroxyapatite and corundum blasted). The samples were submersed into either double-distilled water, human serum, or cell culture medium. Subsequently, the Cu concentration in the supernatant was measured using atomic absorption spectrometry. The test fluid as well as the surface roughness can alter the Cu release significantly, whereby the highest Cu release was determined for samples with corundum-blasted surfaces stored in cell medium.http://dx.doi.org/10.1155/2012/850390 |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Carmen Zietz Andreas Fritsche Birgit Finke Vitezslav Stranak Maximilian Haenle Rainer Hippler Wolfram Mittelmeier Rainer Bader |
spellingShingle |
Carmen Zietz Andreas Fritsche Birgit Finke Vitezslav Stranak Maximilian Haenle Rainer Hippler Wolfram Mittelmeier Rainer Bader Analysis of the Release Characteristics of Cu-Treated Antimicrobial Implant Surfaces Using Atomic Absorption Spectrometry Bioinorganic Chemistry and Applications |
author_facet |
Carmen Zietz Andreas Fritsche Birgit Finke Vitezslav Stranak Maximilian Haenle Rainer Hippler Wolfram Mittelmeier Rainer Bader |
author_sort |
Carmen Zietz |
title |
Analysis of the Release Characteristics of Cu-Treated Antimicrobial Implant Surfaces Using Atomic Absorption Spectrometry |
title_short |
Analysis of the Release Characteristics of Cu-Treated Antimicrobial Implant Surfaces Using Atomic Absorption Spectrometry |
title_full |
Analysis of the Release Characteristics of Cu-Treated Antimicrobial Implant Surfaces Using Atomic Absorption Spectrometry |
title_fullStr |
Analysis of the Release Characteristics of Cu-Treated Antimicrobial Implant Surfaces Using Atomic Absorption Spectrometry |
title_full_unstemmed |
Analysis of the Release Characteristics of Cu-Treated Antimicrobial Implant Surfaces Using Atomic Absorption Spectrometry |
title_sort |
analysis of the release characteristics of cu-treated antimicrobial implant surfaces using atomic absorption spectrometry |
publisher |
Hindawi Limited |
series |
Bioinorganic Chemistry and Applications |
issn |
1565-3633 1687-479X |
publishDate |
2012-01-01 |
description |
New developments of antimicrobial implant surfaces doped with copper (Cu) ions may minimize the risk of implant-associated infections. However, experimental evaluation of the Cu release is influenced by various test parameters. The aim of our study was to evaluate the Cu release characteristics in vitro according to the storage fluid and surface roughness. Plasma immersion ion implantation of Cu (Cu-PIII) and pulsed magnetron sputtering process of a titanium copper film (Ti-Cu) were applied to titanium alloy (Ti6Al4V) samples with different surface finishing of the implant material (polished, hydroxyapatite and corundum blasted). The samples were submersed into either double-distilled water, human serum, or cell culture medium. Subsequently, the Cu concentration in the supernatant was measured using atomic absorption spectrometry. The test fluid as well as the surface roughness can alter the Cu release significantly, whereby the highest Cu release was determined for samples with corundum-blasted surfaces stored in cell medium. |
url |
http://dx.doi.org/10.1155/2012/850390 |
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