Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process

Mechanoluminescence (ML), which emits light upon external mechanical stress, was applied to fibrous composites. Herein, ML particles were incorporated into poly(vinylidene fluoride) (PVDF) and polyacrylonitrile (PAN) electrospun webs to prepare ML/PVDF and ML/PAN composite fabrics. The produced fabr...

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Main Authors:	Halim Lee, Eunjin Cho, Tomas Webbe Kerekes, Seung Lee Kwon, Gun Jin Yun, Jooyoun Kim
Format:	Article
Language:	English
Published:	MDPI AG 2020-07-01
Series:	Polymers
Subjects:	mechanoluminescence electrospinning water-resistant plasma-enhanced chemical vapor deposition sensor smart textile
Online Access:	https://www.mdpi.com/2073-4360/12/8/1720

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record_format	Article
spelling	doaj-5b2b2cde54ad406797fe9c30b827b66a2020-11-25T03:48:10ZengMDPI AGPolymers2073-43602020-07-01121720172010.3390/polym12081720Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition ProcessHalim Lee0Eunjin Cho1Tomas Webbe Kerekes2Seung Lee Kwon3Gun Jin Yun4Jooyoun Kim5Department of Textiles, Merchandising and Fashion Design, Seoul National University, Seoul 08826, KoreaDepartment of Textiles, Merchandising and Fashion Design, Seoul National University, Seoul 08826, KoreaDepartment of Mechanical and Aerospace Engineering, Seoul National University, Seoul 08826, KoreaDepartment of Mechanical and Aerospace Engineering, Seoul National University, Seoul 08826, KoreaDepartment of Mechanical and Aerospace Engineering, Seoul National University, Seoul 08826, KoreaDepartment of Textiles, Merchandising and Fashion Design, Seoul National University, Seoul 08826, KoreaMechanoluminescence (ML), which emits light upon external mechanical stress, was applied to fibrous composites. Herein, ML particles were incorporated into poly(vinylidene fluoride) (PVDF) and polyacrylonitrile (PAN) electrospun webs to prepare ML/PVDF and ML/PAN composite fabrics. The produced fabrics were treated with O<sub>2</sub> and C<sub>4</sub>F<sub>8</sub> plasma to modify the wetting properties, then the effects of composite wettability on the light-emitting response in dry and wet conditions were investigated. The light intensity was greatly decreased when the composite fabrics absorbed water. When the composites were hydrophobized by the C<sub>4</sub>F<sub>8</sub> plasma-enhanced chemical vapor deposition process, the original light intensity was protected in wet conditions, while maintaining the water vapor transmission rate. As the clothing material would be exposed to moisture in varied situations, the reduced ML sensitivity in wet conditions may limit the application of ML composite fabrics. The findings suggest a facile strategy to fabricate moisture-resistant, breathable mechanoluminescence composite fabrics.https://www.mdpi.com/2073-4360/12/8/1720mechanoluminescenceelectrospinningwater-resistantplasma-enhanced chemical vapor depositionsensorsmart textile
collection	DOAJ
language	English
format	Article
sources	DOAJ
author	Halim Lee Eunjin Cho Tomas Webbe Kerekes Seung Lee Kwon Gun Jin Yun Jooyoun Kim
spellingShingle	Halim Lee Eunjin Cho Tomas Webbe Kerekes Seung Lee Kwon Gun Jin Yun Jooyoun Kim Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process Polymers mechanoluminescence electrospinning water-resistant plasma-enhanced chemical vapor deposition sensor smart textile
author_facet	Halim Lee Eunjin Cho Tomas Webbe Kerekes Seung Lee Kwon Gun Jin Yun Jooyoun Kim
author_sort	Halim Lee
title	Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process
title_short	Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process
title_full	Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process
title_fullStr	Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process
title_full_unstemmed	Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process
title_sort	water-resistant mechanoluminescent electrospun fabrics with protected sensitivity in wet condition via plasma-enhanced chemical vapor deposition process
publisher	MDPI AG
series	Polymers
issn	2073-4360
publishDate	2020-07-01
description	Mechanoluminescence (ML), which emits light upon external mechanical stress, was applied to fibrous composites. Herein, ML particles were incorporated into poly(vinylidene fluoride) (PVDF) and polyacrylonitrile (PAN) electrospun webs to prepare ML/PVDF and ML/PAN composite fabrics. The produced fabrics were treated with O<sub>2</sub> and C<sub>4</sub>F<sub>8</sub> plasma to modify the wetting properties, then the effects of composite wettability on the light-emitting response in dry and wet conditions were investigated. The light intensity was greatly decreased when the composite fabrics absorbed water. When the composites were hydrophobized by the C<sub>4</sub>F<sub>8</sub> plasma-enhanced chemical vapor deposition process, the original light intensity was protected in wet conditions, while maintaining the water vapor transmission rate. As the clothing material would be exposed to moisture in varied situations, the reduced ML sensitivity in wet conditions may limit the application of ML composite fabrics. The findings suggest a facile strategy to fabricate moisture-resistant, breathable mechanoluminescence composite fabrics.
topic	mechanoluminescence electrospinning water-resistant plasma-enhanced chemical vapor deposition sensor smart textile
url	https://www.mdpi.com/2073-4360/12/8/1720
work_keys_str_mv	AT halimlee waterresistantmechanoluminescentelectrospunfabricswithprotectedsensitivityinwetconditionviaplasmaenhancedchemicalvapordepositionprocess AT eunjincho waterresistantmechanoluminescentelectrospunfabricswithprotectedsensitivityinwetconditionviaplasmaenhancedchemicalvapordepositionprocess AT tomaswebbekerekes waterresistantmechanoluminescentelectrospunfabricswithprotectedsensitivityinwetconditionviaplasmaenhancedchemicalvapordepositionprocess AT seungleekwon waterresistantmechanoluminescentelectrospunfabricswithprotectedsensitivityinwetconditionviaplasmaenhancedchemicalvapordepositionprocess AT gunjinyun waterresistantmechanoluminescentelectrospunfabricswithprotectedsensitivityinwetconditionviaplasmaenhancedchemicalvapordepositionprocess AT jooyounkim waterresistantmechanoluminescentelectrospunfabricswithprotectedsensitivityinwetconditionviaplasmaenhancedchemicalvapordepositionprocess
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Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process

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