Polishing Sapphire Substrates by 355 nm Ultraviolet Laser

Polishing Sapphire Substrates by 355 nm Ultraviolet Laser

This paper tries to investigate a novel polishing technology with high efficiency and nice surface quality for sapphire crystal that has high hardness, wear resistance, and chemical stability. A Q-switched 355 nm ultraviolet laser with nanosecond pulses was set up and used to polish sapphire substra...

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Bibliographic Details
Main Authors:	X. Wei, X. Z. Xie, W. Hu, J. F. Huang
Format:	Article
Language:	English
Published:	Hindawi Limited 2012-01-01
Series:	International Journal of Optics
Online Access:	http://dx.doi.org/10.1155/2012/238367

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