Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate

Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate

C–F polymer redeposition is generated on the etched sidewall of the patterned air-bearing surface (ABS). This C–F polymer is a by-product from fluorine-based plasma using a Surface Technology Systems multiplex-pro air-bearing etch (ABE). The morphology of the re-deposition and the composite element...

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Main Authors: Alonggot Limcharoen, Pichet Limsuwan, Chupong Pakpum, Krisda Siangchaew
Format: Article
Language:English
Published: Hindawi Limited 2013-01-01
Series:Journal of Nanomaterials
Online Access:http://dx.doi.org/10.1155/2013/851489
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spelling doaj-6a3901f6b3c24200b5d75c24686d6f312020-11-24T22:31:16ZengHindawi LimitedJournal of Nanomaterials1687-41101687-41292013-01-01201310.1155/2013/851489851489Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC SubstrateAlonggot Limcharoen0Pichet Limsuwan1Chupong Pakpum2Krisda Siangchaew3Department of Physics, Faculty of Science, King Mongkut's University of Technology Thonburi, Bangkok 10140, ThailandDepartment of Physics, Faculty of Science, King Mongkut's University of Technology Thonburi, Bangkok 10140, ThailandDivision of Material Science, Faculty of Science, Maejo University, Chiang Mai 50290, ThailandWestern Digital (Thailand) Company Limited, Ayutthaya 13160, ThailandC–F polymer redeposition is generated on the etched sidewall of the patterned air-bearing surface (ABS). This C–F polymer is a by-product from fluorine-based plasma using a Surface Technology Systems multiplex-pro air-bearing etch (ABE). The morphology of the re-deposition and the composite element was observed by a scanning electron microscope (SEM). The chemical bonding results were characterised via X-ray photoelectron spectroscopy, attenuated total reflected infrared spectroscopy and visible Raman spectroscopy. The purpose of this work is to demonstrate a modification of AlF3 re-deposition to C–F polymer re-deposition, which is easily stripped out by an isopropyl alcohol-based solution. The benefit of this research is the removal of the re-deposition in the resist strip process without additional cleaning process steps.http://dx.doi.org/10.1155/2013/851489
collection DOAJ
language English
format Article
sources DOAJ
author Alonggot Limcharoen
Pichet Limsuwan
Chupong Pakpum
Krisda Siangchaew
spellingShingle Alonggot Limcharoen
Pichet Limsuwan
Chupong Pakpum
Krisda Siangchaew
Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate
Journal of Nanomaterials
author_facet Alonggot Limcharoen
Pichet Limsuwan
Chupong Pakpum
Krisda Siangchaew
author_sort Alonggot Limcharoen
title Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate
title_short Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate
title_full Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate
title_fullStr Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate
title_full_unstemmed Characterisation of C–F Polymer Film Formation on the Air-Bearing Surface Etched Sidewall of Fluorine-Based Plasma Interacting with AL2O3–TiC Substrate
title_sort characterisation of c–f polymer film formation on the air-bearing surface etched sidewall of fluorine-based plasma interacting with al2o3–tic substrate
publisher Hindawi Limited
series Journal of Nanomaterials
issn 1687-4110
1687-4129
publishDate 2013-01-01
description C–F polymer redeposition is generated on the etched sidewall of the patterned air-bearing surface (ABS). This C–F polymer is a by-product from fluorine-based plasma using a Surface Technology Systems multiplex-pro air-bearing etch (ABE). The morphology of the re-deposition and the composite element was observed by a scanning electron microscope (SEM). The chemical bonding results were characterised via X-ray photoelectron spectroscopy, attenuated total reflected infrared spectroscopy and visible Raman spectroscopy. The purpose of this work is to demonstrate a modification of AlF3 re-deposition to C–F polymer re-deposition, which is easily stripped out by an isopropyl alcohol-based solution. The benefit of this research is the removal of the re-deposition in the resist strip process without additional cleaning process steps.
url http://dx.doi.org/10.1155/2013/851489
work_keys_str_mv AT alonggotlimcharoen characterisationofcfpolymerfilmformationontheairbearingsurfaceetchedsidewalloffluorinebasedplasmainteractingwithal2o3ticsubstrate
AT pichetlimsuwan characterisationofcfpolymerfilmformationontheairbearingsurfaceetchedsidewalloffluorinebasedplasmainteractingwithal2o3ticsubstrate
AT chupongpakpum characterisationofcfpolymerfilmformationontheairbearingsurfaceetchedsidewalloffluorinebasedplasmainteractingwithal2o3ticsubstrate
AT krisdasiangchaew characterisationofcfpolymerfilmformationontheairbearingsurfaceetchedsidewalloffluorinebasedplasmainteractingwithal2o3ticsubstrate
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