SPEEM: The photoemission microscope at the dedicated microfocus PGM beamline UE49-PGMa at BESSY II

The UE49-PGMa beamline hosts a photoemission electron microscope (PEEM) dedicated to spectromicroscopy and element-selective magnetic imaging on the nanometer scale. The instrument is an Elmitec PEEM III equipped with energy filter and Helium cooled manipulator. Laser driven excitations can be studi...

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Main Authors: Florian Kronast, Sergio Valencia Molina
Format: Article
Language:English
Published: Forschungszentrum Jülich 2016-11-01
Series:Journal of large-scale research facilities JLSRF
Online Access:https://jlsrf.org/index.php/lsf/article/view/86
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spelling doaj-6b79eb6ce92645409af51aaa4f82b4992020-11-24T22:29:54ZengForschungszentrum JülichJournal of large-scale research facilities JLSRF 2364-091X2016-11-012A9010.17815/jlsrf-2-86107SPEEM: The photoemission microscope at the dedicated microfocus PGM beamline UE49-PGMa at BESSY IIFlorian Kronast0Sergio Valencia Molina1Helmholtz-Zentrum Berlin für Materialien und EnergieHelmholtz-Zentrum Berlin für Materialien und EnergieThe UE49-PGMa beamline hosts a photoemission electron microscope (PEEM) dedicated to spectromicroscopy and element-selective magnetic imaging on the nanometer scale. The instrument is an Elmitec PEEM III equipped with energy filter and Helium cooled manipulator. Laser driven excitations can be studied using an attached Ti:Sa laser. A variety of customized sample holders is available for imaging in moderate magnetic / electric field, temperature control, or local laser excitations. With x-rays the instrument is capable of 30 nm spatial resolution.https://jlsrf.org/index.php/lsf/article/view/86
collection DOAJ
language English
format Article
sources DOAJ
author Florian Kronast
Sergio Valencia Molina
spellingShingle Florian Kronast
Sergio Valencia Molina
SPEEM: The photoemission microscope at the dedicated microfocus PGM beamline UE49-PGMa at BESSY II
Journal of large-scale research facilities JLSRF
author_facet Florian Kronast
Sergio Valencia Molina
author_sort Florian Kronast
title SPEEM: The photoemission microscope at the dedicated microfocus PGM beamline UE49-PGMa at BESSY II
title_short SPEEM: The photoemission microscope at the dedicated microfocus PGM beamline UE49-PGMa at BESSY II
title_full SPEEM: The photoemission microscope at the dedicated microfocus PGM beamline UE49-PGMa at BESSY II
title_fullStr SPEEM: The photoemission microscope at the dedicated microfocus PGM beamline UE49-PGMa at BESSY II
title_full_unstemmed SPEEM: The photoemission microscope at the dedicated microfocus PGM beamline UE49-PGMa at BESSY II
title_sort speem: the photoemission microscope at the dedicated microfocus pgm beamline ue49-pgma at bessy ii
publisher Forschungszentrum Jülich
series Journal of large-scale research facilities JLSRF
issn 2364-091X
publishDate 2016-11-01
description The UE49-PGMa beamline hosts a photoemission electron microscope (PEEM) dedicated to spectromicroscopy and element-selective magnetic imaging on the nanometer scale. The instrument is an Elmitec PEEM III equipped with energy filter and Helium cooled manipulator. Laser driven excitations can be studied using an attached Ti:Sa laser. A variety of customized sample holders is available for imaging in moderate magnetic / electric field, temperature control, or local laser excitations. With x-rays the instrument is capable of 30 nm spatial resolution.
url https://jlsrf.org/index.php/lsf/article/view/86
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AT sergiovalenciamolina speemthephotoemissionmicroscopeatthededicatedmicrofocuspgmbeamlineue49pgmaatbessyii
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