Fluoropolymer Film Formation by Electron Activated Vacuum Deposition

• Main Authors: Kostyantyn Grytsenko, Viachaslau Ksianzou, Yurii Kolomzarov, Peter Lytvyn, Birgit Dietzel, Sigurd Schrader
• Format: Article
• Language: English
• Published: MDPI AG 2021-02-01
• Series: Surfaces
• Subjects: fluoropolymer thin film; vacuum deposition; polymerization; plasma; surface
• Online Access: https://www.mdpi.com/2571-9637/4/1/9

Polytetrafluoroethylene (PTFE), polyhexafluoropropylene (PHFP) and polychlorotrifluoroethylene (PCTFE) were heated to their decomposition temperature in a high vacuum. The emitted fragments passed an electron cloud, condensed on a substrate and formed fluoropolymer film. Growth rate of PTFE and PHFP films increased up to a factor five in the presence of the electron cloud. Mass spectrometry revealed changes in the mass spectra of fragments generated by thermal decomposition only and formed under electron activation. The observed changes were different for each fluoropolymer. Infrared spectroscopy (IRS) showed that the structure of the films was close to the structure of the bulk polymers. Atomic force microscopy (AFM) has revealed different morphologies of PTFE, PHFP and PCTFE films, suggesting a Volmer–Weber growth mechanism for PTFE and PHFP but a Frank-van der Merwe one for PCTFE. All films were smooth at nanoscale and transparent from ultraviolet to near-infrared region. Additional radio frequency (RF) plasma ignited in the emitted fragments at a low pressure increased mechanical characteristics of the films without losing their optical transparency and smoothness.