Fluorescence of silicon nanoparticles prepared by nanosecond pulsed laser
A pulsed laser fabrication method is used to prepare fluorescent microstructures on silicon substrates in this paper. A 355 nm nanosecond pulsed laser micromachining system was designed, and the performance was verified and optimized. Fluorescence microscopy was used to analyze the photoluminescence...
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doaj-7aa65497c40b4dff9ad58172c76d8a492020-11-24T21:29:13ZengAIP Publishing LLCAIP Advances2158-32262014-03-0143031332031332-610.1063/1.4868624032493ADVFluorescence of silicon nanoparticles prepared by nanosecond pulsed laserChunyang Liu0Xin Sui1Fang Yang2Xing Fu3Wei Ma4Jishun Li5Yujun Xue6Henan University of Science and Technology, Luoyang, 471003, ChinaHenan University of Science and Technology, Luoyang, 471003, ChinaHenan University of Science and Technology, Luoyang, 471003, ChinaTianjin University, Tianjin, 300072, ChinaHenan University of Science and Technology, Luoyang, 471003, ChinaHenan University of Science and Technology, Luoyang, 471003, ChinaHenan University of Science and Technology, Luoyang, 471003, ChinaA pulsed laser fabrication method is used to prepare fluorescent microstructures on silicon substrates in this paper. A 355 nm nanosecond pulsed laser micromachining system was designed, and the performance was verified and optimized. Fluorescence microscopy was used to analyze the photoluminescence of the microstructures which were formed using the pulsed laser processing technique. Photoluminescence spectra of the microstructure reveal a peak emission around 500 nm, from 370 nm laser irradiation. The light intensity also shows an exponential decay with irradiation time, which is similar to attenuation processes seen in porous silicon. The surface morphology and chemical composition of the microstructure in the fabricated region was also analyzed with multifunction scanning electron microscopy. Spherical particles are produced with diameters around 100 nm. The structure is compared with porous silicon. It is likely that these nanoparticles act as luminescence recombination centers on the silicon surface. The small diameter of the particles modifies the band gap of silicon by quantum confinement effects. Electron-hole pairs recombine and the fluorescence emission shifts into the visible range. The chemical elements of the processed region are also changed during the interaction between laser and silicon. Oxidation and carbonization play an important role in the enhancement of fluorescence emission.http://dx.doi.org/10.1063/1.4868624 |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Chunyang Liu Xin Sui Fang Yang Xing Fu Wei Ma Jishun Li Yujun Xue |
spellingShingle |
Chunyang Liu Xin Sui Fang Yang Xing Fu Wei Ma Jishun Li Yujun Xue Fluorescence of silicon nanoparticles prepared by nanosecond pulsed laser AIP Advances |
author_facet |
Chunyang Liu Xin Sui Fang Yang Xing Fu Wei Ma Jishun Li Yujun Xue |
author_sort |
Chunyang Liu |
title |
Fluorescence of silicon nanoparticles prepared by nanosecond pulsed laser |
title_short |
Fluorescence of silicon nanoparticles prepared by nanosecond pulsed laser |
title_full |
Fluorescence of silicon nanoparticles prepared by nanosecond pulsed laser |
title_fullStr |
Fluorescence of silicon nanoparticles prepared by nanosecond pulsed laser |
title_full_unstemmed |
Fluorescence of silicon nanoparticles prepared by nanosecond pulsed laser |
title_sort |
fluorescence of silicon nanoparticles prepared by nanosecond pulsed laser |
publisher |
AIP Publishing LLC |
series |
AIP Advances |
issn |
2158-3226 |
publishDate |
2014-03-01 |
description |
A pulsed laser fabrication method is used to prepare fluorescent microstructures on silicon substrates in this paper. A 355 nm nanosecond pulsed laser micromachining system was designed, and the performance was verified and optimized. Fluorescence microscopy was used to analyze the photoluminescence of the microstructures which were formed using the pulsed laser processing technique. Photoluminescence spectra of the microstructure reveal a peak emission around 500 nm, from 370 nm laser irradiation. The light intensity also shows an exponential decay with irradiation time, which is similar to attenuation processes seen in porous silicon. The surface morphology and chemical composition of the microstructure in the fabricated region was also analyzed with multifunction scanning electron microscopy. Spherical particles are produced with diameters around 100 nm. The structure is compared with porous silicon. It is likely that these nanoparticles act as luminescence recombination centers on the silicon surface. The small diameter of the particles modifies the band gap of silicon by quantum confinement effects. Electron-hole pairs recombine and the fluorescence emission shifts into the visible range. The chemical elements of the processed region are also changed during the interaction between laser and silicon. Oxidation and carbonization play an important role in the enhancement of fluorescence emission. |
url |
http://dx.doi.org/10.1063/1.4868624 |
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