Obliquely Deposited Titanium Nitride Nanorod Arrays as Surface-Enhanced Raman Scattering Substrates

Obliquely Deposited Titanium Nitride Nanorod Arrays as Surface-Enhanced Raman Scattering Substrates

In this work, titanium nitride (TiN) nanorod arrays were prepared as surface-enhanced Raman scattering (SERS) substrates using glancing angle deposition (GLAD) in a magnetron sputtering system. The nitrogen flow rate was varied from <i>R<sub>N</sub></i><sub>2</sub>...

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Main Authors: Yi-Jun Jen, Meng-Jie Lin, Hou-Lon Cheang, Teh-Li Chan
Format: Article
Language:English
Published: MDPI AG 2019-11-01
Series:Sensors
Subjects:
titanium nitride
nanorod arrays
surface-enhanced raman scattering
Online Access:https://www.mdpi.com/1424-8220/19/21/4765
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spelling doaj-7b9bd4fa4ec94a83936a3c204f2212a32020-11-24T21:50:05ZengMDPI AGSensors1424-82202019-11-011921476510.3390/s19214765s19214765Obliquely Deposited Titanium Nitride Nanorod Arrays as Surface-Enhanced Raman Scattering SubstratesYi-Jun Jen0Meng-Jie Lin1Hou-Lon Cheang2Teh-Li Chan3Department of Electro-Optical Engineering, National Taipei University of Technology, Taipei 106, TaiwanDepartment of Electro-Optical Engineering, National Taipei University of Technology, Taipei 106, TaiwanDepartment of Electro-Optical Engineering, National Taipei University of Technology, Taipei 106, TaiwanDepartment of Electro-Optical Engineering, National Taipei University of Technology, Taipei 106, TaiwanIn this work, titanium nitride (TiN) nanorod arrays were prepared as surface-enhanced Raman scattering (SERS) substrates using glancing angle deposition (GLAD) in a magnetron sputtering system. The nitrogen flow rate was varied from <i>R<sub>N</sub></i><sub>2</sub> = 1 to 3 sccm, yielding five TiN uniform thin films and five TiN nanorod arrays. The figure of merit (FOM) of each TiN uniform film was measured and compared with the SERS signal of each TiN nanorod array. Rhodamine 6G (R6G) was used as the analyte in SERS measurement. For an R6G concentration of 10<sup>−6</sup> M, the analytical enhancement factor (AEF) of the TiN nanorod array that was prepared at <i>R<sub>N</sub></i><sub>2</sub> = 1.5 sccm was 10<sup>4</sup>. The time-durable SERS performance of TiN nanorod arrays was also investigated.https://www.mdpi.com/1424-8220/19/21/4765titanium nitridenanorod arrayssurface-enhanced raman scattering
collection DOAJ
language English
format Article
sources DOAJ
author Yi-Jun Jen
Meng-Jie Lin
Hou-Lon Cheang
Teh-Li Chan
spellingShingle Yi-Jun Jen
Meng-Jie Lin
Hou-Lon Cheang
Teh-Li Chan
Obliquely Deposited Titanium Nitride Nanorod Arrays as Surface-Enhanced Raman Scattering Substrates
Sensors
titanium nitride
nanorod arrays
surface-enhanced raman scattering
author_facet Yi-Jun Jen
Meng-Jie Lin
Hou-Lon Cheang
Teh-Li Chan
author_sort Yi-Jun Jen
title Obliquely Deposited Titanium Nitride Nanorod Arrays as Surface-Enhanced Raman Scattering Substrates
title_short Obliquely Deposited Titanium Nitride Nanorod Arrays as Surface-Enhanced Raman Scattering Substrates
title_full Obliquely Deposited Titanium Nitride Nanorod Arrays as Surface-Enhanced Raman Scattering Substrates
title_fullStr Obliquely Deposited Titanium Nitride Nanorod Arrays as Surface-Enhanced Raman Scattering Substrates
title_full_unstemmed Obliquely Deposited Titanium Nitride Nanorod Arrays as Surface-Enhanced Raman Scattering Substrates
title_sort obliquely deposited titanium nitride nanorod arrays as surface-enhanced raman scattering substrates
publisher MDPI AG
series Sensors
issn 1424-8220
publishDate 2019-11-01
description In this work, titanium nitride (TiN) nanorod arrays were prepared as surface-enhanced Raman scattering (SERS) substrates using glancing angle deposition (GLAD) in a magnetron sputtering system. The nitrogen flow rate was varied from <i>R<sub>N</sub></i><sub>2</sub> = 1 to 3 sccm, yielding five TiN uniform thin films and five TiN nanorod arrays. The figure of merit (FOM) of each TiN uniform film was measured and compared with the SERS signal of each TiN nanorod array. Rhodamine 6G (R6G) was used as the analyte in SERS measurement. For an R6G concentration of 10<sup>−6</sup> M, the analytical enhancement factor (AEF) of the TiN nanorod array that was prepared at <i>R<sub>N</sub></i><sub>2</sub> = 1.5 sccm was 10<sup>4</sup>. The time-durable SERS performance of TiN nanorod arrays was also investigated.
topic titanium nitride
nanorod arrays
surface-enhanced raman scattering
url https://www.mdpi.com/1424-8220/19/21/4765
work_keys_str_mv AT yijunjen obliquelydepositedtitaniumnitridenanorodarraysassurfaceenhancedramanscatteringsubstrates
AT mengjielin obliquelydepositedtitaniumnitridenanorodarraysassurfaceenhancedramanscatteringsubstrates
AT houloncheang obliquelydepositedtitaniumnitridenanorodarraysassurfaceenhancedramanscatteringsubstrates
AT tehlichan obliquelydepositedtitaniumnitridenanorodarraysassurfaceenhancedramanscatteringsubstrates
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