Thickness Measurement of V2O5 Nanometric Thin Films Using a Portable XRF
Nanometric thin films have always been chiefly used for decoration; however they are now being widely used as the basis of high technology. Among the various physical qualities that characterize them, the thickness strongly influences their properties. Thus, a new procedure is hereby proposed and de...
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2016-01-01
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Series: | Journal of Spectroscopy |
Online Access: | http://dx.doi.org/10.1155/2016/9509043 |
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doaj-7cd4d838d940403fafb0772e9377d0f92020-11-25T01:14:58ZengHindawi LimitedJournal of Spectroscopy2314-49202314-49392016-01-01201610.1155/2016/95090439509043Thickness Measurement of V2O5 Nanometric Thin Films Using a Portable XRFFabio Lopes0Luís Henrique Cardozo Amorin1Larissa da Silva Martins2Alexandre Urbano3Carlos Roberto Appoloni4Roberto Cesareo5Laboratório de Física Nuclear Aplicada, Departamento de Física, Universidade Estadual de Londrina, Campus Universitário, Caixa Postal 10011, 86057-970 Londrina, PR, BrazilLaboratório de Filmes Finos e Materiais, Departamento de Física, Universidade Estadual de Londrina, Campus Universitário, Caixa Postal 10011, 86057-970 Londrina, PR, BrazilLaboratório de Filmes Finos e Materiais, Departamento de Física, Universidade Estadual de Londrina, Campus Universitário, Caixa Postal 10011, 86057-970 Londrina, PR, BrazilLaboratório de Filmes Finos e Materiais, Departamento de Física, Universidade Estadual de Londrina, Campus Universitário, Caixa Postal 10011, 86057-970 Londrina, PR, BrazilLaboratório de Física Nuclear Aplicada, Departamento de Física, Universidade Estadual de Londrina, Campus Universitário, Caixa Postal 10011, 86057-970 Londrina, PR, BrazilInstituto di Matematica e Fisica, Università degli Studi di Sassari, Via Viena 2, 07100 Sassari, ItalyNanometric thin films have always been chiefly used for decoration; however they are now being widely used as the basis of high technology. Among the various physical qualities that characterize them, the thickness strongly influences their properties. Thus, a new procedure is hereby proposed and developed for determining the thickness of V2O5 nanometric thin films deposited on the glass surface using Portable X-Ray Fluorescence (PXRF) equipment and the attenuation of the radiation intensity Kα of calcium present in the glass. It is shown through the present paper that the radiation intensity of calcium Kα rays is proportional to film thickness in nanometric films of vanadium deposited on the glass surface.http://dx.doi.org/10.1155/2016/9509043 |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Fabio Lopes Luís Henrique Cardozo Amorin Larissa da Silva Martins Alexandre Urbano Carlos Roberto Appoloni Roberto Cesareo |
spellingShingle |
Fabio Lopes Luís Henrique Cardozo Amorin Larissa da Silva Martins Alexandre Urbano Carlos Roberto Appoloni Roberto Cesareo Thickness Measurement of V2O5 Nanometric Thin Films Using a Portable XRF Journal of Spectroscopy |
author_facet |
Fabio Lopes Luís Henrique Cardozo Amorin Larissa da Silva Martins Alexandre Urbano Carlos Roberto Appoloni Roberto Cesareo |
author_sort |
Fabio Lopes |
title |
Thickness Measurement of V2O5 Nanometric Thin Films Using a Portable XRF |
title_short |
Thickness Measurement of V2O5 Nanometric Thin Films Using a Portable XRF |
title_full |
Thickness Measurement of V2O5 Nanometric Thin Films Using a Portable XRF |
title_fullStr |
Thickness Measurement of V2O5 Nanometric Thin Films Using a Portable XRF |
title_full_unstemmed |
Thickness Measurement of V2O5 Nanometric Thin Films Using a Portable XRF |
title_sort |
thickness measurement of v2o5 nanometric thin films using a portable xrf |
publisher |
Hindawi Limited |
series |
Journal of Spectroscopy |
issn |
2314-4920 2314-4939 |
publishDate |
2016-01-01 |
description |
Nanometric thin films have always been chiefly used for decoration; however they are now being widely used as the basis of high technology. Among the various physical qualities that characterize them, the thickness strongly influences their properties. Thus, a new procedure is hereby proposed and developed for determining the thickness of V2O5 nanometric thin films deposited on the glass surface using Portable X-Ray Fluorescence (PXRF) equipment and the attenuation of the radiation intensity Kα of calcium present in the glass. It is shown through the present paper that the radiation intensity of calcium Kα rays is proportional to film thickness in nanometric films of vanadium deposited on the glass surface. |
url |
http://dx.doi.org/10.1155/2016/9509043 |
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