Thickness Measurement of V2O5 Nanometric Thin Films Using a Portable XRF

• Main Authors: Fabio Lopes, Luís Henrique Cardozo Amorin, Larissa da Silva Martins, Alexandre Urbano, Carlos Roberto Appoloni, Roberto Cesareo
• Format: Article
• Language: English
• Published: Hindawi Limited 2016-01-01
• Series: Journal of Spectroscopy
• Online Access: http://dx.doi.org/10.1155/2016/9509043

Nanometric thin films have always been chiefly used for decoration; however they are now being widely used as the basis of high technology. Among the various physical qualities that characterize them, the thickness strongly influences their properties. Thus, a new procedure is hereby proposed and developed for determining the thickness of V2O5 nanometric thin films deposited on the glass surface using Portable X-Ray Fluorescence (PXRF) equipment and the attenuation of the radiation intensity Kα of calcium present in the glass. It is shown through the present paper that the radiation intensity of calcium Kα rays is proportional to film thickness in nanometric films of vanadium deposited on the glass surface.