Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial Absorbers

Metamaterial absorbers are photonic structures composed of an array of sub-wavelength metallic patterns. Results in literature are usually based on structures of nominal dimensions, despite the significant effect of fabrication tolerances on performance. This research aims to identify the main sourc...

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Main Authors:	Mohammadamir Ghaderi, Ehsan Karimi, N. Pelin Ayerden, Reinoud F. Wolffenbuttel
Format:	Article
Language:	English
Published:	MDPI AG 2017-08-01
Series:	Proceedings
Subjects:	metamaterial absorber mid-infrared UV lithography tolerance sensitivity fabrication
Online Access:	https://www.mdpi.com/2504-3900/1/4/328

id	doaj-7f0a5df1f42841bead31cfff0c3ecf2b
record_format	Article
spelling	doaj-7f0a5df1f42841bead31cfff0c3ecf2b2020-11-24T21:27:39ZengMDPI AGProceedings2504-39002017-08-011432810.3390/proceedings1040328proceedings1040328Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial AbsorbersMohammadamir Ghaderi0Ehsan Karimi1N. Pelin Ayerden2Reinoud F. Wolffenbuttel3Electronic Instrumentation Laboratory, Department of Microelectronics, Faculty of EEMCS, Delft University of Technology, Delft, The NetherlandsElectronic Instrumentation Laboratory, Department of Microelectronics, Faculty of EEMCS, Delft University of Technology, Delft, The NetherlandsElectronic Instrumentation Laboratory, Department of Microelectronics, Faculty of EEMCS, Delft University of Technology, Delft, The NetherlandsElectronic Instrumentation Laboratory, Department of Microelectronics, Faculty of EEMCS, Delft University of Technology, Delft, The NetherlandsMetamaterial absorbers are photonic structures composed of an array of sub-wavelength metallic patterns. Results in literature are usually based on structures of nominal dimensions, despite the significant effect of fabrication tolerances on performance. This research aims to identify the main sources of uncertainty and to investigate their effect, notably that of an irregular surface quality (i.e., roughness) of the thin metallic layer and the lithography related variations in size and shape. The effect of the shape and positioning of the resonance peak was investigated and validated using mid-infrared metamaterial absorbers. This sensitivity analysis is essential to the batch fabrication of metamaterial absorbers for MEMS applications.https://www.mdpi.com/2504-3900/1/4/328metamaterial absorbermid-infraredUV lithographytolerance sensitivityfabrication
collection	DOAJ
language	English
format	Article
sources	DOAJ
author	Mohammadamir Ghaderi Ehsan Karimi N. Pelin Ayerden Reinoud F. Wolffenbuttel
spellingShingle	Mohammadamir Ghaderi Ehsan Karimi N. Pelin Ayerden Reinoud F. Wolffenbuttel Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial Absorbers Proceedings metamaterial absorber mid-infrared UV lithography tolerance sensitivity fabrication
author_facet	Mohammadamir Ghaderi Ehsan Karimi N. Pelin Ayerden Reinoud F. Wolffenbuttel
author_sort	Mohammadamir Ghaderi
title	Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial Absorbers
title_short	Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial Absorbers
title_full	Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial Absorbers
title_fullStr	Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial Absorbers
title_full_unstemmed	Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial Absorbers
title_sort	fabrication tolerance sensitivity in large-area mid-infrared metamaterial absorbers
publisher	MDPI AG
series	Proceedings
issn	2504-3900
publishDate	2017-08-01
description	Metamaterial absorbers are photonic structures composed of an array of sub-wavelength metallic patterns. Results in literature are usually based on structures of nominal dimensions, despite the significant effect of fabrication tolerances on performance. This research aims to identify the main sources of uncertainty and to investigate their effect, notably that of an irregular surface quality (i.e., roughness) of the thin metallic layer and the lithography related variations in size and shape. The effect of the shape and positioning of the resonance peak was investigated and validated using mid-infrared metamaterial absorbers. This sensitivity analysis is essential to the batch fabrication of metamaterial absorbers for MEMS applications.
topic	metamaterial absorber mid-infrared UV lithography tolerance sensitivity fabrication
url	https://www.mdpi.com/2504-3900/1/4/328
work_keys_str_mv	AT mohammadamirghaderi fabricationtolerancesensitivityinlargeareamidinfraredmetamaterialabsorbers AT ehsankarimi fabricationtolerancesensitivityinlargeareamidinfraredmetamaterialabsorbers AT npelinayerden fabricationtolerancesensitivityinlargeareamidinfraredmetamaterialabsorbers AT reinoudfwolffenbuttel fabricationtolerancesensitivityinlargeareamidinfraredmetamaterialabsorbers
_version_	1725974225021304832

Fabrication Tolerance Sensitivity in Large-Area Mid-Infrared Metamaterial Absorbers

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