Investigation of the Corrosion Behavior of Atomic Layer Deposited Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> Nanolaminate Thin Films on Copper in 0.1 M NaCl
Fifty nanometers of Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> nanolaminate thin films deposited by atomic layer deposition (ALD) were investigated for protection of copper in 0.1 M NaCl using electrochemical techniques. Coated samples showed increases in pol...
Main Authors: | , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2019-02-01
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Series: | Materials |
Subjects: | |
Online Access: | https://www.mdpi.com/1996-1944/12/4/672 |