Investigation of the Corrosion Behavior of Atomic Layer Deposited Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> Nanolaminate Thin Films on Copper in 0.1 M NaCl

Investigation of the Corrosion Behavior of Atomic Layer Deposited Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> Nanolaminate Thin Films on Copper in 0.1 M NaCl

Fifty nanometers of Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub> nanolaminate thin films deposited by atomic layer deposition (ALD) were investigated for protection of copper in 0.1 M NaCl using electrochemical techniques. Coated samples showed increases in pol...

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Bibliographic Details
Main Authors: Michael A. Fusco, Christopher J. Oldham, Gregory N. Parsons
Format: Article
Language:English
Published: MDPI AG 2019-02-01
Series:Materials
Subjects:
atomic layer deposition
corrosion protection
copper
aluminum oxide
titanium oxide
nanolaminate
electrochemical impedance spectroscopy
barrier coatings
Online Access:https://www.mdpi.com/1996-1944/12/4/672

Internet

https://www.mdpi.com/1996-1944/12/4/672

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