Reactive Plasma N-Doping of Amorphous Carbon Electrodes: Decoupling Disorder and Chemical Effects on Capacitive and Electrocatalytic Performance

Nitrogen-free amorphous carbon thin films prepared via sputtering followed by graphitization, were used as precursor materials for the creation of N-doped carbon electrodes with varying degrees of amorphization. Incorporation of N-sites was achieved via nitrogen plasma treatments which resulted in b...

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Bibliographic Details
Main Authors: Md. Khairul Hoque, James A. Behan, James Creel, James G. Lunney, Tatiana S. Perova, Paula E. Colavita
Format: Article
Language:English
Published: Frontiers Media S.A. 2020-11-01
Series:Frontiers in Chemistry
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Online Access:https://www.frontiersin.org/articles/10.3389/fchem.2020.593932/full

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