Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering
Fluorine doped tin oxide (FTO) coatings have been prepared using the mid-frequency pulsed DC closed field unbalanced magnetron sputtering technique in an Ar/O2 atmosphere using blends of tin oxide and tin fluoride powder formed into targets. FTO coatings were deposited with a thickness of 400 nm on...
Main Authors: | Ziad Y. Banyamin, Peter J. Kelly, Glen West, Jeffery Boardman |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2014-10-01
|
Series: | Coatings |
Subjects: | |
Online Access: | http://www.mdpi.com/2079-6412/4/4/732 |
Similar Items
-
Electrical and Optical Properties of Amorphous SnO<sub>2</sub>:Ta Films, Prepared by DC and RF Magnetron Sputtering: A Systematic Study of the Influence of the Type of the Reactive Gas
by: Rainald Mientus, et al.
Published: (2020-02-01) -
Investigation of the Optoelectronic Properties of Ti-doped Indium Tin Oxide Thin Film
by: Nen-Wen Pu, et al.
Published: (2015-09-01) -
Morphology and Corrosion Behavior Study of Thin TiN Films Deposited at Different Substrates by DC Magnetron Sputtering
by: Bassam Abdallah, et al.
Published: (2021-03-01) -
Thin copolymer-cased light-emitting display made with fluorine-foped tin oxide substrates
by: Rudolf Lessmann, et al.
Published: (2004-09-01) -
Sputter-Deposited Indium–Tin Oxide Thin Films for Acetaldehyde Gas Sensing
by: Umut Cindemir, et al.
Published: (2016-04-01)