The Effects of Substrate Bias on the Properties of HfC Coatings Deposited by RF Magnetron Sputtering
In the paper, by using radio frequency (RF) magnetron sputter technology, the HfC coating grew on a 316L stainless steel substrate in an Ar atmosphere at various substrate bias voltages from 0 to −200 V. From the X-ray diffraction (XRD) and transmission electron microscopy (TEM) experiments, the HfC...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-08-01
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| Series: | Coatings |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-6412/11/8/963 |