Extraction of Preisach model parameters for fluorite-structure ferroelectrics and antiferroelectrics

Abstract Flourite-structure ferroelectrics (FEs) and antiferroelectrics (AFEs) such as HfO2 and its variants have gained copious attention from the semiconductor community, because they enable complementary metal-oxide-semiconductor (CMOS)-compatible platforms for high-density, high-performance non-...

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Main Authors: Zheng Wang, Jae Hur, Nujhat Tasneem, Winston Chern, Shimeng Yu, Asif Khan
Format: Article
Language:English
Published: Nature Publishing Group 2021-06-01
Series:Scientific Reports
Online Access:https://doi.org/10.1038/s41598-021-91492-w
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spelling doaj-a54ea8f3c3e94176a2b9cbf6d98f838f2021-06-20T11:34:30ZengNature Publishing GroupScientific Reports2045-23222021-06-011111810.1038/s41598-021-91492-wExtraction of Preisach model parameters for fluorite-structure ferroelectrics and antiferroelectricsZheng Wang0Jae Hur1Nujhat Tasneem2Winston Chern3Shimeng Yu4Asif Khan5Georgia Institute of Technology, School of Electrical and Computer EngineeringGeorgia Institute of Technology, School of Electrical and Computer EngineeringGeorgia Institute of Technology, School of Electrical and Computer EngineeringDepartment of Electrical Engineering and Computer Science, Massachusetts Institute of TechnologyGeorgia Institute of Technology, School of Electrical and Computer EngineeringGeorgia Institute of Technology, School of Electrical and Computer EngineeringAbstract Flourite-structure ferroelectrics (FEs) and antiferroelectrics (AFEs) such as HfO2 and its variants have gained copious attention from the semiconductor community, because they enable complementary metal-oxide-semiconductor (CMOS)-compatible platforms for high-density, high-performance non-volatile and volatile memory technologies. While many individual experiments have been conducted to characterize and understand fluorite-structure FEs and AFEs, there has been little effort to aggregate the information needed to benchmark and provide insights into their properties. We present a fast and robust modeling framework that automatically fits the Preisach model to the experimental polarization ( $$Q_{FE}$$ Q FE ) versus electric field ( $$E_{FE}$$ E FE ) hysteresis characterizations of fluorite-structure FEs. The modifications to the original Preisach model allow the double hysteresis loops in fluorite-structure antiferroelectrics to be captured as well. By fitting the measured data reported in the literature, we observe that ferroelectric polarization and dielectric constant decrease as the coercive field rises in general.https://doi.org/10.1038/s41598-021-91492-w
collection DOAJ
language English
format Article
sources DOAJ
author Zheng Wang
Jae Hur
Nujhat Tasneem
Winston Chern
Shimeng Yu
Asif Khan
spellingShingle Zheng Wang
Jae Hur
Nujhat Tasneem
Winston Chern
Shimeng Yu
Asif Khan
Extraction of Preisach model parameters for fluorite-structure ferroelectrics and antiferroelectrics
Scientific Reports
author_facet Zheng Wang
Jae Hur
Nujhat Tasneem
Winston Chern
Shimeng Yu
Asif Khan
author_sort Zheng Wang
title Extraction of Preisach model parameters for fluorite-structure ferroelectrics and antiferroelectrics
title_short Extraction of Preisach model parameters for fluorite-structure ferroelectrics and antiferroelectrics
title_full Extraction of Preisach model parameters for fluorite-structure ferroelectrics and antiferroelectrics
title_fullStr Extraction of Preisach model parameters for fluorite-structure ferroelectrics and antiferroelectrics
title_full_unstemmed Extraction of Preisach model parameters for fluorite-structure ferroelectrics and antiferroelectrics
title_sort extraction of preisach model parameters for fluorite-structure ferroelectrics and antiferroelectrics
publisher Nature Publishing Group
series Scientific Reports
issn 2045-2322
publishDate 2021-06-01
description Abstract Flourite-structure ferroelectrics (FEs) and antiferroelectrics (AFEs) such as HfO2 and its variants have gained copious attention from the semiconductor community, because they enable complementary metal-oxide-semiconductor (CMOS)-compatible platforms for high-density, high-performance non-volatile and volatile memory technologies. While many individual experiments have been conducted to characterize and understand fluorite-structure FEs and AFEs, there has been little effort to aggregate the information needed to benchmark and provide insights into their properties. We present a fast and robust modeling framework that automatically fits the Preisach model to the experimental polarization ( $$Q_{FE}$$ Q FE ) versus electric field ( $$E_{FE}$$ E FE ) hysteresis characterizations of fluorite-structure FEs. The modifications to the original Preisach model allow the double hysteresis loops in fluorite-structure antiferroelectrics to be captured as well. By fitting the measured data reported in the literature, we observe that ferroelectric polarization and dielectric constant decrease as the coercive field rises in general.
url https://doi.org/10.1038/s41598-021-91492-w
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