High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO<sub>2</sub>films: the effect of repetition frequency
<p>Abstract</p><p>The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO<sub>2</sub>thin films using dc dual magnetron (DM) sputtering in Ar + O<sub>2</sub>mixture on unheated glass substrates. The DM was operated in a bip...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
SpringerOpen
2007-01-01
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| Series: | Nanoscale Research Letters |
| Subjects: | |
| Online Access: | http://dx.doi.org/10.1007/s11671-007-9042-z |
| Summary: | <p>Abstract</p><p>The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO<sub>2</sub>thin films using dc dual magnetron (DM) sputtering in Ar + O<sub>2</sub>mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with Ti(99.5) targets of 50 mm in diameter. The substrate surface temperature T<sub>surf</sub>measured by a thermostrip was less than 180 °C for all experiments. The effect of the repetition frequency f<sub>r</sub>was investigated in detail. It was found that the increase of f<sub>r</sub>from 100 to 350 kHz leads to (a) an improvement of the efficiency of the deposition process that results in a significant increase of the deposition rate a<sub>D</sub>of sputtered TiO<sub>2</sub>films and (b) a decrease of peak pulse voltage and sustaining of the magnetron discharge at higher target power densities. It was demonstrated that several hundreds nm thick hydrophilic TiO<sub>2</sub>films can be sputtered on unheated glass substrates at a<sub>D</sub> = 80 nm/min, T<sub>surf</sub> < 180 °C when high value of f<sub>r</sub> = 350 kHz was used. Properties of a thin hydrophilic TiO<sub>2</sub>film deposited on a polycarbonate substrate are given.</p> |
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| ISSN: | 1931-7573 1556-276X |