Sol-gel deposition and electrical properties of laser irradiated Cu doped TiO2 multilayer thin films

Sol-gel deposition and electrical properties of laser irradiated Cu doped TiO2 multilayer thin films

Multilayer thin films (3, 5 and 7) of 20% copper doped titanium dioxide (Cu:TiO2) have been deposited on glass substrates by sol-gel spin coating method. After deposition, films have been irradiated by a beam of continuous wave diode laser (532 nm) for two minutes at the angle of 45°. Structural, su...

Full description

Bibliographic Details
Main Authors: M.I. Khan, M. Mujeeb, Umar Farooq
Format: Article
Language:English
Published: Elsevier 2017-01-01
Series:Results in Physics
Online Access:http://www.sciencedirect.com/science/article/pii/S2211379717308112
id doaj-afbebb27dc8949f68022110c70a1b039
record_format Article
spelling doaj-afbebb27dc8949f68022110c70a1b0392020-11-24T21:41:39ZengElsevierResults in Physics2211-37972017-01-01724852488Sol-gel deposition and electrical properties of laser irradiated Cu doped TiO2 multilayer thin filmsM.I. Khan0M. Mujeeb1Umar Farooq2Corresponding author.; Department of Physics, The University of Lahore, 53700, PakistanDepartment of Physics, The University of Lahore, 53700, PakistanDepartment of Physics, The University of Lahore, 53700, PakistanMultilayer thin films (3, 5 and 7) of 20% copper doped titanium dioxide (Cu:TiO2) have been deposited on glass substrates by sol-gel spin coating method. After deposition, films have been irradiated by a beam of continuous wave diode laser (532 nm) for two minutes at the angle of 45°. Structural, surface morphology and electrical properties of films have been investigated by X-rays diffraction (XRD), scanning electron microscope (SEM) and four point probe technique respectively. XRD shows the formation of titanium copper oxide. Surface morphology of thin films indicated that the average grain size is increased by increasing the number of layers. The average sheet resistivity of 3, 5 and 7 layers of thin films measured by four point probe technique is 2.2 × 104, 1.2 × 104 and 1.0 × 104 (Ohm-cm) respectively. The present study will facilitate a cost effective and environmental friendly study for several properties of materials. Keywords: Cu:TiO2, Multilayer thin films, Diode laserhttp://www.sciencedirect.com/science/article/pii/S2211379717308112
collection DOAJ
language English
format Article
sources DOAJ
author M.I. Khan
M. Mujeeb
Umar Farooq
spellingShingle M.I. Khan
M. Mujeeb
Umar Farooq
Sol-gel deposition and electrical properties of laser irradiated Cu doped TiO2 multilayer thin films
Results in Physics
author_facet M.I. Khan
M. Mujeeb
Umar Farooq
author_sort M.I. Khan
title Sol-gel deposition and electrical properties of laser irradiated Cu doped TiO2 multilayer thin films
title_short Sol-gel deposition and electrical properties of laser irradiated Cu doped TiO2 multilayer thin films
title_full Sol-gel deposition and electrical properties of laser irradiated Cu doped TiO2 multilayer thin films
title_fullStr Sol-gel deposition and electrical properties of laser irradiated Cu doped TiO2 multilayer thin films
title_full_unstemmed Sol-gel deposition and electrical properties of laser irradiated Cu doped TiO2 multilayer thin films
title_sort sol-gel deposition and electrical properties of laser irradiated cu doped tio2 multilayer thin films
publisher Elsevier
series Results in Physics
issn 2211-3797
publishDate 2017-01-01
description Multilayer thin films (3, 5 and 7) of 20% copper doped titanium dioxide (Cu:TiO2) have been deposited on glass substrates by sol-gel spin coating method. After deposition, films have been irradiated by a beam of continuous wave diode laser (532 nm) for two minutes at the angle of 45°. Structural, surface morphology and electrical properties of films have been investigated by X-rays diffraction (XRD), scanning electron microscope (SEM) and four point probe technique respectively. XRD shows the formation of titanium copper oxide. Surface morphology of thin films indicated that the average grain size is increased by increasing the number of layers. The average sheet resistivity of 3, 5 and 7 layers of thin films measured by four point probe technique is 2.2 × 104, 1.2 × 104 and 1.0 × 104 (Ohm-cm) respectively. The present study will facilitate a cost effective and environmental friendly study for several properties of materials. Keywords: Cu:TiO2, Multilayer thin films, Diode laser
url http://www.sciencedirect.com/science/article/pii/S2211379717308112
work_keys_str_mv AT mikhan solgeldepositionandelectricalpropertiesoflaserirradiatedcudopedtio2multilayerthinfilms
AT mmujeeb solgeldepositionandelectricalpropertiesoflaserirradiatedcudopedtio2multilayerthinfilms
AT umarfarooq solgeldepositionandelectricalpropertiesoflaserirradiatedcudopedtio2multilayerthinfilms
_version_ 1725920737914519552

Similar Items