Disorder-free sputtering method on graphene

Disorder-free sputtering method on graphene

Deposition of various materials onto graphene without causing any disorder is highly desirable for graphene applications. Especially, sputtering is a versatile technique to deposit various metals and insulators for spintronics, and indium tin oxide to make transparent devices. However, the sputterin...

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Main Authors: Xue Peng Qiu, Young Jun Shin, Jing Niu, Narayanapillai Kulothungasagaran, Gopinadhan Kalon, Caiyu Qiu, Ting Yu, Hyunsoo Yang
Format: Article
Language:English
Published: AIP Publishing LLC 2012-09-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4739783
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spelling doaj-afc2fef8fcbd4502a4ee5f570cd5d0c92020-11-25T01:27:42ZengAIP Publishing LLCAIP Advances2158-32262012-09-0123032121032121-610.1063/1.4739783021203ADVDisorder-free sputtering method on grapheneXue Peng Qiu0Young Jun Shin1Jing Niu2Narayanapillai Kulothungasagaran3Gopinadhan Kalon4Caiyu Qiu5Ting Yu6Hyunsoo Yang7Department of Electrical and Computer Engineering, National University of Singapore, 117576, SingaporeDepartment of Electrical and Computer Engineering, National University of Singapore, 117576, SingaporeDepartment of Electrical and Computer Engineering, National University of Singapore, 117576, SingaporeDepartment of Electrical and Computer Engineering, National University of Singapore, 117576, SingaporeDepartment of Electrical and Computer Engineering, National University of Singapore, 117576, SingaporeDivision of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, 637616, SingaporeGraphene Research Centre, National University of Singapore, 117546, SingaporeDepartment of Electrical and Computer Engineering, National University of Singapore, 117576, SingaporeDeposition of various materials onto graphene without causing any disorder is highly desirable for graphene applications. Especially, sputtering is a versatile technique to deposit various metals and insulators for spintronics, and indium tin oxide to make transparent devices. However, the sputtering process causes damage to graphene because of high energy sputtered atoms. By flipping the substrate and using a high Ar pressure, we demonstrate that the level of damage to graphene can be reduced or eliminated in dc, rf, and reactive sputtering processes.http://dx.doi.org/10.1063/1.4739783
collection DOAJ
language English
format Article
sources DOAJ
author Xue Peng Qiu
Young Jun Shin
Jing Niu
Narayanapillai Kulothungasagaran
Gopinadhan Kalon
Caiyu Qiu
Ting Yu
Hyunsoo Yang
spellingShingle Xue Peng Qiu
Young Jun Shin
Jing Niu
Narayanapillai Kulothungasagaran
Gopinadhan Kalon
Caiyu Qiu
Ting Yu
Hyunsoo Yang
Disorder-free sputtering method on graphene
AIP Advances
author_facet Xue Peng Qiu
Young Jun Shin
Jing Niu
Narayanapillai Kulothungasagaran
Gopinadhan Kalon
Caiyu Qiu
Ting Yu
Hyunsoo Yang
author_sort Xue Peng Qiu
title Disorder-free sputtering method on graphene
title_short Disorder-free sputtering method on graphene
title_full Disorder-free sputtering method on graphene
title_fullStr Disorder-free sputtering method on graphene
title_full_unstemmed Disorder-free sputtering method on graphene
title_sort disorder-free sputtering method on graphene
publisher AIP Publishing LLC
series AIP Advances
issn 2158-3226
publishDate 2012-09-01
description Deposition of various materials onto graphene without causing any disorder is highly desirable for graphene applications. Especially, sputtering is a versatile technique to deposit various metals and insulators for spintronics, and indium tin oxide to make transparent devices. However, the sputtering process causes damage to graphene because of high energy sputtered atoms. By flipping the substrate and using a high Ar pressure, we demonstrate that the level of damage to graphene can be reduced or eliminated in dc, rf, and reactive sputtering processes.
url http://dx.doi.org/10.1063/1.4739783
work_keys_str_mv AT xuepengqiu disorderfreesputteringmethodongraphene
AT youngjunshin disorderfreesputteringmethodongraphene
AT jingniu disorderfreesputteringmethodongraphene
AT narayanapillaikulothungasagaran disorderfreesputteringmethodongraphene
AT gopinadhankalon disorderfreesputteringmethodongraphene
AT caiyuqiu disorderfreesputteringmethodongraphene
AT tingyu disorderfreesputteringmethodongraphene
AT hyunsooyang disorderfreesputteringmethodongraphene
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