Rational Design of Binary Alloys for Catalytic Growth of Graphene via Chemical Vapor Deposition

Chemical vapor deposition is the most promising technique for the mass production of high-quality graphene, in which the metal substrate plays a crucial role in the catalytic decomposition of the carbon source, assisting the attachment of the active carbon species, and regulating the structure of th...

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Main Authors:	Yanglizhi Li, Luzhao Sun, Haiyang Liu, Yuechen Wang, Zhongfan Liu
Format:	Article
Language:	English
Published:	MDPI AG 2020-11-01
Series:	Catalysts
Subjects:	alloy catalyst chemical vapor deposition graphene fast growth layer number control
Online Access:	https://www.mdpi.com/2073-4344/10/11/1305

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record_format	Article
spelling	doaj-b388d7ecedcb4b79b3e9bef399eb596f2020-11-25T04:06:05ZengMDPI AGCatalysts2073-43442020-11-01101305130510.3390/catal10111305Rational Design of Binary Alloys for Catalytic Growth of Graphene via Chemical Vapor DepositionYanglizhi Li0Luzhao Sun1Haiyang Liu2Yuechen Wang3Zhongfan Liu4Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, ChinaCenter for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, ChinaCenter for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, ChinaCenter for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, ChinaCenter for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, ChinaChemical vapor deposition is the most promising technique for the mass production of high-quality graphene, in which the metal substrate plays a crucial role in the catalytic decomposition of the carbon source, assisting the attachment of the active carbon species, and regulating the structure of the graphene film. Due to some drawbacks of single metal substrates, alloy substrates have gradually attracted attention owing to their complementarity in the catalytic growth of graphene. In this review, we focus on the rational design of binary alloys, such as Cu/Ni, Ni/Mo, and Cu/Si, to control the layer numbers and growth rate of graphene. By analyzing the elementary steps of graphene growth, general principles are summarized in terms of the catalytic activity, metal–carbon interactions, carbon solubility, and mutual miscibility. Several challenges in this field are also put forward to inspire the novel design of alloy catalysts and the synthesis of graphene films bearing desirable properties.https://www.mdpi.com/2073-4344/10/11/1305alloy catalystchemical vapor depositiongraphenefast growthlayer number control
collection	DOAJ
language	English
format	Article
sources	DOAJ
author	Yanglizhi Li Luzhao Sun Haiyang Liu Yuechen Wang Zhongfan Liu
spellingShingle	Yanglizhi Li Luzhao Sun Haiyang Liu Yuechen Wang Zhongfan Liu Rational Design of Binary Alloys for Catalytic Growth of Graphene via Chemical Vapor Deposition Catalysts alloy catalyst chemical vapor deposition graphene fast growth layer number control
author_facet	Yanglizhi Li Luzhao Sun Haiyang Liu Yuechen Wang Zhongfan Liu
author_sort	Yanglizhi Li
title	Rational Design of Binary Alloys for Catalytic Growth of Graphene via Chemical Vapor Deposition
title_short	Rational Design of Binary Alloys for Catalytic Growth of Graphene via Chemical Vapor Deposition
title_full	Rational Design of Binary Alloys for Catalytic Growth of Graphene via Chemical Vapor Deposition
title_fullStr	Rational Design of Binary Alloys for Catalytic Growth of Graphene via Chemical Vapor Deposition
title_full_unstemmed	Rational Design of Binary Alloys for Catalytic Growth of Graphene via Chemical Vapor Deposition
title_sort	rational design of binary alloys for catalytic growth of graphene via chemical vapor deposition
publisher	MDPI AG
series	Catalysts
issn	2073-4344
publishDate	2020-11-01
description	Chemical vapor deposition is the most promising technique for the mass production of high-quality graphene, in which the metal substrate plays a crucial role in the catalytic decomposition of the carbon source, assisting the attachment of the active carbon species, and regulating the structure of the graphene film. Due to some drawbacks of single metal substrates, alloy substrates have gradually attracted attention owing to their complementarity in the catalytic growth of graphene. In this review, we focus on the rational design of binary alloys, such as Cu/Ni, Ni/Mo, and Cu/Si, to control the layer numbers and growth rate of graphene. By analyzing the elementary steps of graphene growth, general principles are summarized in terms of the catalytic activity, metal–carbon interactions, carbon solubility, and mutual miscibility. Several challenges in this field are also put forward to inspire the novel design of alloy catalysts and the synthesis of graphene films bearing desirable properties.
topic	alloy catalyst chemical vapor deposition graphene fast growth layer number control
url	https://www.mdpi.com/2073-4344/10/11/1305
work_keys_str_mv	AT yanglizhili rationaldesignofbinaryalloysforcatalyticgrowthofgrapheneviachemicalvapordeposition AT luzhaosun rationaldesignofbinaryalloysforcatalyticgrowthofgrapheneviachemicalvapordeposition AT haiyangliu rationaldesignofbinaryalloysforcatalyticgrowthofgrapheneviachemicalvapordeposition AT yuechenwang rationaldesignofbinaryalloysforcatalyticgrowthofgrapheneviachemicalvapordeposition AT zhongfanliu rationaldesignofbinaryalloysforcatalyticgrowthofgrapheneviachemicalvapordeposition
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Rational Design of Binary Alloys for Catalytic Growth of Graphene via Chemical Vapor Deposition

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