Research on the influence of the filtrating electrode on the structure and optical properties of TiO2 thin films prepared by the energy filtering magnetron sputtering technique
TiO2 thin films were deposited by the energy filtrating magnetron sputtering (EFMS) technique and the traditional direct current magnetron sputtering (DMS) technique. The influence of the filtering electrode mesh number on the structure and optical properties of TiO2 thin films was investigated. The...
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doaj-c47f571006624713a1a793fcf0484d8d2021-09-06T19:22:36ZengSciendoMaterials Science-Poland2083-134X2020-03-013811710.2478/msp-2019-0082msp-2019-0082Research on the influence of the filtrating electrode on the structure and optical properties of TiO2 thin films prepared by the energy filtering magnetron sputtering techniqueWang Zhaoyong0Jiang Weifen1Lu Yifan2Wang Xinlian3Huang Xiaoya4Yao Ning5School of Mathematics and Physics, Henan Urban Construction University, Pingdingshan 467036, ChinaDepartments of Mathematics and Information Science, North China University of Water Resources and Electric Power, Zhengzhou450045, ChinaSchool of Mechatronics Engineering, Harbin Institute of Technology,Harbin150001, ChinaSchool of Mathematics and Physics, Henan Urban Construction University, Pingdingshan 467036, ChinaSchool of Mathematics and Physics, Henan Urban Construction University, Pingdingshan 467036, ChinaSchool of Physical Engineering and Laboratory of Material Physics, Zhengzhou University, Zhengzhou450052, ChinaTiO2 thin films were deposited by the energy filtrating magnetron sputtering (EFMS) technique and the traditional direct current magnetron sputtering (DMS) technique. The influence of the filtering electrode mesh number on the structure and optical properties of TiO2 thin films was investigated. The structure, surface morphology and optical properties were characterized by XRD, SEM and ellipsometric spectroscopy, respectively. Results show that the TiO2 thin films deposited by the DMS and EFMS techniques at the same deposition parameters are composed of the anatase phase exclusively. TiO2 thin films deposited at lower deposition rate by the EFMS technique have lower crystallinity, smaller particle size and smoother surface. With increasing the mesh number, the refractive index, extinction coefficient and optical band gap are larger.https://doi.org/10.2478/msp-2019-0082energy filtering magnetron sputteringtio2 thin filmoptical property |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Wang Zhaoyong Jiang Weifen Lu Yifan Wang Xinlian Huang Xiaoya Yao Ning |
spellingShingle |
Wang Zhaoyong Jiang Weifen Lu Yifan Wang Xinlian Huang Xiaoya Yao Ning Research on the influence of the filtrating electrode on the structure and optical properties of TiO2 thin films prepared by the energy filtering magnetron sputtering technique Materials Science-Poland energy filtering magnetron sputtering tio2 thin film optical property |
author_facet |
Wang Zhaoyong Jiang Weifen Lu Yifan Wang Xinlian Huang Xiaoya Yao Ning |
author_sort |
Wang Zhaoyong |
title |
Research on the influence of the filtrating electrode on the structure and optical properties of TiO2 thin films prepared by the energy filtering magnetron sputtering technique |
title_short |
Research on the influence of the filtrating electrode on the structure and optical properties of TiO2 thin films prepared by the energy filtering magnetron sputtering technique |
title_full |
Research on the influence of the filtrating electrode on the structure and optical properties of TiO2 thin films prepared by the energy filtering magnetron sputtering technique |
title_fullStr |
Research on the influence of the filtrating electrode on the structure and optical properties of TiO2 thin films prepared by the energy filtering magnetron sputtering technique |
title_full_unstemmed |
Research on the influence of the filtrating electrode on the structure and optical properties of TiO2 thin films prepared by the energy filtering magnetron sputtering technique |
title_sort |
research on the influence of the filtrating electrode on the structure and optical properties of tio2 thin films prepared by the energy filtering magnetron sputtering technique |
publisher |
Sciendo |
series |
Materials Science-Poland |
issn |
2083-134X |
publishDate |
2020-03-01 |
description |
TiO2 thin films were deposited by the energy filtrating magnetron sputtering (EFMS) technique and the traditional direct current magnetron sputtering (DMS) technique. The influence of the filtering electrode mesh number on the structure and optical properties of TiO2 thin films was investigated. The structure, surface morphology and optical properties were characterized by XRD, SEM and ellipsometric spectroscopy, respectively. Results show that the TiO2 thin films deposited by the DMS and EFMS techniques at the same deposition parameters are composed of the anatase phase exclusively. TiO2 thin films deposited at lower deposition rate by the EFMS technique have lower crystallinity, smaller particle size and smoother surface. With increasing the mesh number, the refractive index, extinction coefficient and optical band gap are larger. |
topic |
energy filtering magnetron sputtering tio2 thin film optical property |
url |
https://doi.org/10.2478/msp-2019-0082 |
work_keys_str_mv |
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