Tailoring the structural and magnetic properties of masked CoPt thin films using ion implantation

• Main Authors: Durgesh Kumar, Surbhi Gupta, Tianli Jin, R. Nongjai, K. Asokan, S. N. Piramanayagam
• Format: Article
• Language: English
• Published: AIP Publishing LLC 2018-05-01
• Series: AIP Advances
• Online Access: http://dx.doi.org/10.1063/1.5007767

The effects of ion implantations through a mask on the structural and magnetic properties of Co80Pt20 films were investigated. The mask was patterned using the self-assembly of diblock copolymers. For implantation, high (40 keV for 14N+ and 100 keV for 40Ar+) and low (7.5 keV for 14N+ and 4.5 keV for 40Ar+) energy 14N+ and 40Ar+ ions were used to modify the structural and magnetic properties of these films. X-ray diffraction and TRIM simulations were performed for understanding the structural changes due to ion implantations. These results revealed the intermixing of Co atoms in lower layers and lattice expansion in Co80Pt20 magnetic and Ru layers. A lateral straggling of Co caused an increase in the exchange coupling in the masked region. Depletion of Co atoms in Co80Pt20 layer caused a decrease in the anisotropy constant, which were further confirmed by the alternating gradient force magnetometer and magnetic force microscopy results. The magnetic force microscopy images showed an increase in domain width and domain wall width confirming the above-mentioned effects.