Magnetic transitions driven by temperature in surface oxidized Co0.10Ni0.90/Cu(001) ultrathin films
The magnetization of Co0.10Ni0.90/Cu(001) films before and after surface oxidization at 300 K is presented. Before the oxidization, the magnetization of the films in the thickness of 11 to 20 monolayers (ML) is in the in-plane direction at the temperature ranging from 140 K to 300 K. After the oxidi...
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doaj-c83e26584dd645dea6b83cf655e13fe92020-11-24T22:24:22ZengAIP Publishing LLCAIP Advances2158-32262014-01-0141017132017132-610.1063/1.4864037034401ADVMagnetic transitions driven by temperature in surface oxidized Co0.10Ni0.90/Cu(001) ultrathin filmsYing-Ta Shih0Wen-He Shen1Kuo-Long Lee2Wei Pan3Department of Physics, National Chung Cheng University, Min-Hsiung, Chia-Yi 621, TaiwanDepartment of Physics, National Chung Cheng University, Min-Hsiung, Chia-Yi 621, TaiwanDepartment of Physics, National Chung Cheng University, Min-Hsiung, Chia-Yi 621, TaiwanDepartment of Physics, National Chung Cheng University, Min-Hsiung, Chia-Yi 621, TaiwanThe magnetization of Co0.10Ni0.90/Cu(001) films before and after surface oxidization at 300 K is presented. Before the oxidization, the magnetization of the films in the thickness of 11 to 20 monolayers (ML) is in the in-plane direction at the temperature ranging from 140 K to 300 K. After the oxidization, the magnetizations of the films are in the in-plane direction at the temperature above 200 K, but transit to magnetization demolishment, in-plane-and-out-of-plane co-existence, spin reorientation transition, and coercivity enhancement, for films of 11, 12, 13, and above 15 ML, respectively. The blocking temperature of this film is also 200 K, which implies the transitions might be driven by the ordering of the antiferromagnetic surface oxides. The various magnetizations provide a model system for manipulating the magnetization direction, as well as a spin valve device by combination of the oxidized films.http://dx.doi.org/10.1063/1.4864037 |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Ying-Ta Shih Wen-He Shen Kuo-Long Lee Wei Pan |
spellingShingle |
Ying-Ta Shih Wen-He Shen Kuo-Long Lee Wei Pan Magnetic transitions driven by temperature in surface oxidized Co0.10Ni0.90/Cu(001) ultrathin films AIP Advances |
author_facet |
Ying-Ta Shih Wen-He Shen Kuo-Long Lee Wei Pan |
author_sort |
Ying-Ta Shih |
title |
Magnetic transitions driven by temperature in surface oxidized Co0.10Ni0.90/Cu(001) ultrathin films |
title_short |
Magnetic transitions driven by temperature in surface oxidized Co0.10Ni0.90/Cu(001) ultrathin films |
title_full |
Magnetic transitions driven by temperature in surface oxidized Co0.10Ni0.90/Cu(001) ultrathin films |
title_fullStr |
Magnetic transitions driven by temperature in surface oxidized Co0.10Ni0.90/Cu(001) ultrathin films |
title_full_unstemmed |
Magnetic transitions driven by temperature in surface oxidized Co0.10Ni0.90/Cu(001) ultrathin films |
title_sort |
magnetic transitions driven by temperature in surface oxidized co0.10ni0.90/cu(001) ultrathin films |
publisher |
AIP Publishing LLC |
series |
AIP Advances |
issn |
2158-3226 |
publishDate |
2014-01-01 |
description |
The magnetization of Co0.10Ni0.90/Cu(001) films before and after surface oxidization at 300 K is presented. Before the oxidization, the magnetization of the films in the thickness of 11 to 20 monolayers (ML) is in the in-plane direction at the temperature ranging from 140 K to 300 K. After the oxidization, the magnetizations of the films are in the in-plane direction at the temperature above 200 K, but transit to magnetization demolishment, in-plane-and-out-of-plane co-existence, spin reorientation transition, and coercivity enhancement, for films of 11, 12, 13, and above 15 ML, respectively. The blocking temperature of this film is also 200 K, which implies the transitions might be driven by the ordering of the antiferromagnetic surface oxides. The various magnetizations provide a model system for manipulating the magnetization direction, as well as a spin valve device by combination of the oxidized films. |
url |
http://dx.doi.org/10.1063/1.4864037 |
work_keys_str_mv |
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