Effect of the CO2/SiH4 Ratio in the p-μc-SiO:H Emitter Layer on the Performance of Crystalline Silicon Heterojunction Solar Cells

This paper reports the preparation of wide gap p-type hydrogenated microcrystalline silicon oxide (p-μc-SiO:H) films using a 40 MHz very high frequency plasma enhanced chemical vapor deposition technique. The reported work focused on the effects of the CO2/SiH4 ratio on the properties of p-μc-SiO:H...

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Bibliographic Details
Main Authors: Jaran Sritharathikhun, Taweewat Krajangsang, Apichan Moollakorn, Sorapong Inthisang, Amornrat Limmanee, Aswin Hongsingtong, Nattaphong Boriraksantikul, Tianchai Taratiwat, Nirod Akarapanjavit, Kobsak Sriprapha
Format: Article
Language:English
Published: Hindawi Limited 2014-01-01
Series:International Journal of Photoenergy
Online Access:http://dx.doi.org/10.1155/2014/872849