Fabrication of carbon nanomembranes by helium ion beam lithography

Fabrication of carbon nanomembranes by helium ion beam lithography

The irradiation-induced cross-linking of aromatic self-assembled monolayers (SAMs) is a universal method for the fabrication of ultrathin carbon nanomembranes (CNMs). Here we demonstrate the cross-linking of aromatic SAMs due to exposure to helium ions. The distinction of cross-linked from non-cross...

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Bibliographic Details
Main Authors: Xianghui Zhang, Henning Vieker, André Beyer, Armin Gölzhäuser
Format: Article
Language:English
Published: Beilstein-Institut 2014-02-01
Series:Beilstein Journal of Nanotechnology
Subjects:
carbon nanomembranes
dissociative electron attachment
helium ion microscopy
ion beam-organic molecules interactions
self-assembled monolayers
Online Access:https://doi.org/10.3762/bjnano.5.20

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